Planar hybrid heterostructures on the monolayer – GaN system

Keywords: monolayer, 2D-material, MoS2, channel, heterostructure, phonons, concentration, electric field, current-voltage characteristic, scattering, numerical simulation

Abstract

Background. Graphene-like two-dimensional (2D) materials as promising for creating the future element base of electronics are considered. Interactions between layers of two-dimensional materials are not limited by chemical bonding and matching of the interfacial lattice. It is permitted to form heterojunctions both from different 2D materials and hybrid 2D/3D heterojunctions, having many unique characteristics and opportunities for application. One of the actual tasks is to study 2D/3D heterojunctions, and possibility of their usage as elements of electronic devices to improve or change their properties.

The aim of the work. The aim of study is to determine characteristics of planar diodes based on bulk materials (GaN), in which monolayers act as structural elements forming a 2D/3D heterojunction with a diode channel.

Techniques and Methodology. Mathematical simulation of charge transfer processes is carried out applying a two-dimensional model of a planar diode by using Ensemble Monte Carlo technique. Since the main mechanism of charge carrier redistribution between regions of different sizes was considered to be transitions involving phonons, a channel based on molybdenum dichalcogenide (MoS2), which forms a heterojunction with GaN - diode channel, was analyzed. The peculiarities of the space charge regions formation near 2D/3D - heteroboundaries are analyzed. Static characteristics of diodes were determined.

Results Charge carriers distributions in the diode channel according to the ratio of the impurity concentration in the monolayer and the channel were obtained in the course of the research. Influence of the monolayer on average concentration of electrons in the channel was studied. Dependences of current on applied voltage in a diode with a monolayer is obtained. A significant effect on charge transfer processes in the diode channel was established which can be achieved when the doping level of the GaN-based channel does not exceed 4·1022 m-3.

Conclusions: The main factors affecting on the total current of a planar diode with a 3D/2D heterojunction are the parameters of the bulk part of the diode, the channel width and the doping level leading to the appearance of depleted GaN layer bordering the monolayer.

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Author Biographies

O. V. Botsula, V. N. Karazin Kharkiv National University

61022, Kharkiv, Svobody square, 4

K. H. Prykhodko, V. N. Karazin Kharkiv National University

61022, Kharkiv, Svobody square, 4

V. O. Zozulia, V. N. Karazin Kharkiv National University

61022, м. Харків, майдан Свободи,4

D. O. Shtoda, V. N. Karazin Kharkiv National University

61022, Kharkiv, Svobody square, 4

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Published
2025-12-30
Cited
How to Cite
Botsula, O. V., Prykhodko, K. H., Zozulia, V. O., & Shtoda, D. O. (2025). Planar hybrid heterostructures on the monolayer – GaN system. Visnyk of V.N. Karazin Kharkiv National University, Series “Radio Physics and Electronics”, (43), 55-61. https://doi.org/10.26565/2311-0872-2025-43-05