Modeling the Density-of-States Spectrum Under Strain in Doped Silicon p‑Si<B, Mn>
Abstract
A deformation (strain) model of the spectrum of the density of localized states Nss(E,X) in p‑Si⟨B,Mn⟩ under uniaxial pressure X is presented. It is shown that the shifts of trap levels can be described by the deformation energy Ed = κX, a mechanical analogue of kT. At a fixed temperature T = 77 K, increasing X leads to a shift and restructuring of the spectrum: thermodonor (TD) levels move toward the conduction band, whereas manganese (Mn) levels shift toward the valence band, which agrees with the opposite trends observed in ρ(X) and μ(X).
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References
O.O. Mamatkarimov, O. Khimmatkulov, and I.G. Tursunov, “Tensostimulated Effect in a Doped and Heat-Treated Silicon at an Oriented Deformation,” Phys. Solid State, 63, 738–741 (2021). https://doi.org/10.1134/S1063783421050127
N. Zikrillaev, Kh. Iliev, G. Mavlonov, S. Isamov, and M. Madjitov, “Negative magnetoresistance in silicon doped with manganese,” E3S Web of Conferences, 401, (2023). https://doi.org/10.1051/e3sconf/202340105094
G. Gulyamov, N.U. Sharibaev, “Determination of the density of surface states at the semiconductor-insulator interface in a metal-insulator-semiconductor structure,” Semiconductors, 45, 174–178 (2011). https://doi.org/10.1134/S1063782611020084
N.Yu. Sharibaev, PhD Dissertation, Namangan State Technical University (2023).
K. Torigoe, and T. Ono, “Formation of thermal donor enhanced by oxygen precipitation in silicon crystal,” AIP Advances, 10, 045019 (2020). https://doi.org/10.1063/1.5140206
D. Zhang, X. Chen, Y. Jin, X. Cao, D. Zhu, Y. Wang, G. Ding, et al., “Raman study on vapor-phase equilibrated Er:LiNbO3 and Er:Ti:LiNbO3 crystals,” Appl. Phys. A, 72, 95–102 (2001). https://doi.org/10.1007/s003390000595
A. Peaker, J. Evans-Freeman, L. Dobaczewski, V. Markevich, O. Andersen, L. Rubaldo, et al., “High Resolution Laplace Deep Level Transient Spectroscopy A New Tool To Study Implant Damage In Silicon,” (2002). https://www.researchgate.net/publication/2834687_High_Resolution_Laplace_Deep_Level_Transient_Spectroscopy_A_New_Tool_To_Study_Implant_Damage_In_Silicon
Y. Tokuyama, M. Suezawa, N. Fukata, T. Taishi, and K. Hoshikawa, “Occupation site change of self-interstitials and group-III acceptors in Si crystals: Dopant dependence of the Watkins replacement efficiency,” Phys. Rev. B, 69, 125217 (2004). https://doi.org/10.1103/PhysRevB.69.125217
H. Yin, A. Kumar, J.M. LeBeau, and R. Jaramillo, “Defect-level switching for highly nonlinear and hysteretic electronic devices,” Phys. Rev. Applied, 15, 014014 (2021). https://doi.org/10.1103/PhysRevApplied.15.014014
S. Tyaginov, V. Sverdlov, I. Starkov, W. Gös, and T. Grasser, “Impact of O–Si–O bond angle fluctuations on the Si–O bond-breakage rate,” Microelectronics Reliability, 49, 1260–1264 (2009). https://doi.org/10.1016/j.microrel.2009.06.018
J. Rozen, S. Dhar, M.E. Zvanut, and J.R. Williams, “Density of interface states, electron traps, and hole traps as a function of the nitrogen density in SiO₂ on SiC,” J. Appl. Phys. 105, 124506 (2009). https://doi.org/10.1063/1.3131845
A.A. Barlian; W.-T. Park; J.R. Mallon; A.J. Rastegar; and B.L. Pruitt, “Review: Semiconductor Piezoresistance for Microsystems,” Proceedings of the IEEE, 97(3), 513–552 (2009). https://doi.org/10.1109/JPROC.2009.2013612
Copyright (c) 2026 M.A. Rakhmanov, I.G. Tursunov, O.O. Mamatkarimov, N.Yu. Sharibaev, S.S. Sharipbaev

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