Determination of the Energy Spectrum of the Density of States Under Uniaxial Pressure
Abstract
This paper considers the influence of hydrostatic pressure on the energy spectrum of the density of localized states in doped silicon n-Si, n-Si⟨Ni⟩ and p-Si⟨B,Mn⟩. Based on the experimental dependence of the relative resistivity ρp/ρ0 on pressure, a model is constructed in which pressure enters via the deformation energy Ed = κP, yielding a linear shift of the trap levels Ei(P) = Ei(0)+αiEd. It is shown that for different impurity centers (Mn, Ni) the deformation sensitivity of the levels differs in both sign and magnitude, which is manifested in qualitatively different behavior of ρp/ρ0(P). A procedure is proposed for reconstructing the relative electron concentration N(P)/N0 and the associated spectrum Nss(E,P) from the experimental ρp/ρ0(P) curves. A comparison is made with the conventional temperature DLTS model, and the possibility of using a “tenso-DLTS” approach to identify donor and acceptor centers, their deformation potentials and symmetry is substantiated. The results demonstrate that hydrostatic pressure is not only an external perturbation, but also an effective spectrum-forming parameter for controlling the electronic properties of doped silicon.
Downloads
References
[[1] A. Peaker, J. Evans-Freeman, L. Dobaczewski, V. Markevich, O. Andersen, L. Rubaldo, P. Kan, et al., “High Resolution Laplace Deep Level Transient Spectroscopy a New Tool to Study Implant Damage in Silicon,” (2002). https://www.researchgate.net/publication/2834687_High_Resolution_Laplace_Deep_Level_Transient_Spectroscopy_A_New_Tool_To_Study_Implant_Damage_In_Silicon
T.G. Rappoport, P. Redliński, X. Liu, G. Zaránd, J.K. Furdyna, and B. Jankó, |”Anomalous behavior of spin-wave resonances in Ga₁₋ₓMnₓAs thin films,”| Phys. Rev. B, 69, 125213 (2004). https://doi.org/10.1103/PhysRevB.69.125213
Y. Tokuyama, M. Suezawa, N. Fukata, T. Taishi, and K. Hoshikawa, “Occupation site change of self-interstitials and group-III acceptors in Si crystals: Dopant dependence of the Watkins replacement efficiency,” Phys. Rev. B, 69, 125217 (2004). https://doi.org/10.1103/PhysRevB.69.125217
V. Kolkovsky, A. Mesli, L. Dobaczewski, N.V. Abrosimov, Z.R. Żytkiewicz, and A.R. Peaker, “Interaction of iron with the local environment in SiGe alloys investigated with Laplace transform deep level spectroscopy,” Phys. Rev. B, 74, 195204 (2006). HTTPS://DOI.ORG/10.1103/PhysRevB.74.195204
D. Yang, and X. Ma, “Defects and Impurities in Silicon Materials,” in: Handbook of Integrated Circuit Industry, edited by Y. Wang, M.H. Chi, J.J.C. Lou, and C.Z. Chen, (Springer, Singapore, 2024). https://doi.org/10.1007/978-981-99-2836-1_76
D. Zhang, X. Chen, Y. Jin, et al., “Raman study on vapor-phase equilibrated Er:LiNbO3 and Er:Ti:LiNbO3 crystals,” Appl Phys A, 72, 95–102 (2001). https://doi.org/10.1007/s003390000595
H. Yin, A. Kumar, J.M. LeBeau, and R. Jaramillo, “Defect-level switching for highly nonlinear and hysteretic electronic devices,” Phys. Rev. Applied, 15, 014014 (2021). https://doi.org/10.1103/PhysRevApplied.15.014014
S. Tyaginov, V. Sverdlov, I. Starkov, W. Gös, and T. Grasser, “Impact of O–Si–O bond angle fluctuations on the Si–O bond-breakage rate,” Microelectronics Reliability, 49, 1260–1264 (2009). https://doi.org/10.1016/j.microrel.2009.06.018
J. Rozen, S. Dhar, M.E. Zvanut, and J.R. Williams, “Density of interface states, electron traps, and hole traps as a function of the nitrogen density in SiO₂ on SiC,” J. Appl. Phys. 105, 124506 (2009). https://doi.org/10.1063/1.3131845
P. Sharmila, G. Supraja, D. Haripriya, C. Sivamani, A.L. Narayana, “Silicon carbide MOSFETs: A critical review of applications, technological advancements, and future perspectives,” Micro and Nanostructures, 202, 208126 (2025). https://doi.org/10.1016/j.micrna.2025.208126
A.C.H. Rowe, “Piezoresistance in silicon and its nanostructures,” J. Mater. Res. 29, 731–744 (2014). https://doi.org/10.1557/jmr.2014.52
A.A. Barlian, W.-T. Park, J.R. Mallon, A.J. Rastegar, and B.L. Pruitt, “Review: Semiconductor Piezoresistance for Microsystems,” Proceedings of the IEEE, 97(3), 513–552 (2009) https://doi.org/10.1109/JPROC.2009.2013612
G. Gulyamov, and N.U. Sharibaev, “Determination of the density of surface states at the semiconductor-insulator interface in a metal-insulator-semiconductor structure,” Semiconductors, 45, 174–178 (2011). https://doi.org/10.1134/S1063782611020084
O.O. Mamatkarimov, O. Khimmatkulov, and I.G. Tursunov, “Tensostimulated Effect in a Doped and Heat-Treated Silicon at an Oriented Deformation,” Phys. Solid State, 63, 738–741 (2021). https://doi.org/10.1134/S1063783421050127
Copyright (c) 2026 M.A. Rakhmanov, I.G. Tursunov, O.O. Mamatkarimov, N.Yu. Sharibaev, S.S. Sharipbaev

This work is licensed under a Creative Commons Attribution 4.0 International License.
Authors who publish with this journal agree to the following terms:
- Authors retain copyright and grant the journal right of first publication with the work simultaneously licensed under a Creative Commons Attribution License that allows others to share the work with an acknowledgment of the work's authorship and initial publication in this journal.
- Authors are able to enter into separate, additional contractual arrangements for the non-exclusive distribution of the journal's published version of the work (e.g., post it to an institutional repository or publish it in a book), with an acknowledgment of its initial publication in this journal.
- Authors are permitted and encouraged to post their work online (e.g., in institutional repositories or on their website) prior to and during the submission process, as it can lead to productive exchanges, as well as earlier and greater citation of published work (See The Effect of Open Access).



