Critical Size and Doping Thresholds Governing Band Gap Evolution in Semiconductors
Abstract
Understanding how the band gap ( Eg) of semiconductors evolves with size, dimensionality, and doping concentration is crucial for optimizing modern electronic and optoelectronic devices. In this work, we perform a systematic analysis of critical sizes ( Lc) and doping thresholds (Nc ) governing significant band gap modification in Si, GaAs, InP, CdS, and GaN. Using effective mass theory with Coulomb corrections, Varshni temperature dependence, and numercical simulations, we identify that quantum confinement dominates when L ≲ 2a*B, yielding Lc = 10 nm for Si, 22 nm for GaAs, 6 nm for CdS, and 5–6 nm for GaN. The corresponding Mott-like critical doping thresholds satisfy Nc1⁄3 a*B≈0.25, giving Nc = 1.8·1018 cm-3 (Si), 5.6·1017 cm-3 (GaAs), and 2.9·1018cm-3(CdS). For quantum dots (0D) at r = 2nm, band gaps increase by ~0.9 eV for Si, ~1.3 eV for GaAs, and ~5.5 eV for GaN, while 1D nanowires exhibit 20–35% smaller shifts due to partial carrier delocalization along the wire axis. Temperature effects are minor (~0.01–0.03 eV from 50–500 K), confirming that dimensional confinement is the dominant factor. These results provide quantitative guidelines for engineering tunable band gaps in LEDs, lasers, Si tandem solar cells, UV optoelectronics, and photodetectors, offering a predictive framework for IV, III–V, and II–VI semiconductor nanostructures.
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Copyright (c) 2026 J.Sh. Abdullayev, D.A. Qalandarova, M.Sh. Ibragimova, U.A. Akberadjiyeva, D.I. Yunusova, Zevarjon Jumaboyeva, Sh.A. Shoyusupov, I.O. Jumaniyozov

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