Mg-Induced Enhancement of Memristive Switching in SnO₂ Thin Films

  • Jamoliddin X. Murodov Tashkent State Technical University named after Islam Karimov, Tashkent, Uzbekistan; Center of Nanotechnology Development, National University of Uzbekistan https://orcid.org/0009-0006-3088-4881
  • Shavkat U. Yuldashev Center of Nanotechnology Development, National University of Uzbekistan https://orcid.org/0000-0002-2187-5960
  • Azamat O. Arslanov National University of Uzbekistan named after Mirzo Ulugbek, Tashkent, Uzbekistan https://orcid.org/0009-0000-4817-8770
  • Noiba U. Botirova Center of Nanotechnology Development, National University of Uzbekistan
  • Javohir Sh. Xudoyqulov National University of Uzbekistan named after Mirzo Ulugbek, Tashkent, Uzbekistan
  • Marguba S. Mirkamilova Tashkent State Technical University named after Islam Karimov, Tashkent, Uzbekistan
  • Inobat Q. Qodirova Tashkent State Technical University named after Islam Karimov, Tashkent, Uzbekistan
  • Odilboy X. Ximmatqulov Tashkent State Technical University named after Islam Karimov, Tashkent, Uzbekistan
Keywords: SnO₂, Mg doping, Memristor, Resistive switching, Non-volatile memory

Abstract

Magnesium-doped tin oxide (SnO₂:Mg) thin films have attracted considerable attention as promising materials for next-generation non-volatile memory devices due to their stable resistive switching behavior and simple fabrication processes. In this work, SnO₂ thin films were fabricated by ultrasonic spray pyrolysis using a precursor solution containing 20 mol.% Mg and systematically investigated to evaluate their memristive switching characteristics, electrical performance, and conduction behavior. Structural analysis confirmed the formation of uniform polycrystalline thin films with a crystallite size of approximately 30 nm, while energy-dispersive X-ray spectroscopy (EDS) revealed an actual Mg content of approximately 5 at.%, indicating partial incorporation of Mg into the SnO₂ lattice. Electrical measurements demonstrated reproducible bipolar resistive switching with an ON/OFF resistance ratio of approximately 10³ and stable switching behavior over multiple cycles with low voltage variation (±5%) compared to previously reported undoped SnO₂ films. The observed improvement in memristive performance is attributed to Mg-induced modifications of defect states and charge-transport pathways within the oxide matrix. Conduction analysis indicates a transition from ohmic behavior at low bias to space-charge-limited conduction (SCLC) at higher voltages, consistent with a quadratic current–voltage relationship (I ∝ V²). These results demonstrate that Mg incorporation is an effective defect-engineering strategy for tuning the electrical properties of SnO₂ thin films and improving their suitability for reliable memristor and non-volatile memory applications. This approach provides a simple and scalable route for engineering oxide-based memristive devices.

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Published
2026-06-10
Cited
How to Cite
Murodov, J. X., Yuldashev, S. U., Arslanov, A. O., Botirova, N. U., Xudoyqulov, J. S., Mirkamilova, M. S., Qodirova, I. Q., & Ximmatqulov, O. X. (2026). Mg-Induced Enhancement of Memristive Switching in SnO₂ Thin Films. East European Journal of Physics, (2), 132-137. https://doi.org/10.26565/2312-4334-2026-2-12

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