X-ray study of the structure and stress state of TiN coatings deposited from filtered cathodic-arc plasma in the gas mixture N2 with Ar
Keywords:
vacuum arc deposition, filtered plasma, high-voltage pulse bias potential, nitride coatings, argon, compressive stress, ion bombardment
Abstract
Results of studies of the structure and stress state of coatings deposited by PIII & D method from the filtered cathodic vaccum-arc plasma flow with a high-voltage pulse bias potential with an amplitude of 1 kV applied to the substrate have been discussed. The influence on the characteristics of the TiN coatings additives of Ar in the range 0 to 45 % to N2 medium have been studied with the help of the X-ray diffraction method. The coatings irrespective of the concentration of argon in the gas mixture have a TiN structure (structure type NaCl) with a strong axial texture [110]. With an increase of argon content the level of compressive stresses in the coatings substantially increases from 7 GPa to 10 GPa, the crystallite size decreases slightly from 8.9 nm to 7 nm, and the hardness of the coating remains on an enough high level of 27–32 GPa. The effect of the argon additives on the coatings growth process has been discussed.
Downloads
Download data is not yet available.
References
Handbook of Vacuum Arc Science and Technology: Fundamentals and Applications / Eds. R. L. Boxman, P. J. Martin, D. M. Sanders. — New York: Noyes, Park Ridge, 1995. — 742 p.
Anders A. Cathodic Arcs: From Fractal Spots to Energetic Condensation. — New York: Springer Inc., 2008. — 540 p.
Mukherjee S., Prokert F., Richter E., Moeller W. Intrinsic stress and preferred orientation in TiN coatings deposited on Al using plasma immersion ion implantation assisted deposition // Thin Solid Films. — 2003. — Vol. 445. — P. 48–53.
Anders A., Anders S., Brown I., Dickinson M., MacGill R. Metal plasma immersion ion implantation and deposition using vacuum arc plasma sources // J. Vac. Sci. Technol. — 1994. — B. 12. — P. 815–820.
Bilek M., McKenzie D., Moeller W. Use of low energy and high frequency PBII during thin film deposition to achieve relief of intrinsic stress and microstructural changes // Surface & Coatings Technology. — 2004. — Vol. 186. — P. 21–28.
Akkaya S. S., Vasyliev V. V., Reshetnyak E. N., Kazmanlı K., Solak N., Strel’nitskij V. E., Ürgen M. Structure and properties of TiN coatings produced with PIII&D technique using high efficiency rectilinear filter cathodic arc plasma // Surface & Coatings Technology. — 2013. — Vol. 236. — P. 332–340.
Mayrhofer P., Mitterer C., Hultman L., Clemens H. Microstructural design of hard coatings // Progress in Materials Science. — 2006. — Vol. 51. — P. 1032–1114.
Veprek S., Veprek-Heijman M., Karvankova P., Prochazka J. Different approaches to superhard coatings and nanocomposites // Thin Solid Films. — 2005. — Vol. 476. — P. 1–29.
Lomino N. S., Ovcharenko V. D., Andreev A. A. On Mechanism of Vacuum-Arc Plasma Activation in the Range of Pressures 1–10 Pa // IEEE Transactions on Plasma Science. — 2005. — Vol. 33, No. 5. — P. 1626–1630.
Zhitomirsky V., Kinrot U., Alterkop B., Boxman R. L., Goldsmith S. Influence of gas pressure on the ion current and its distribution in a filtered vacuum arc deposition system // Surface and Coatings Technology. — 1995. — Vol. 86–87. — P. 263–270.
Cheng Y., Zheng Y. Effect of N2/Ar gas flow ratio on the deposition of TiN/Ti coatings on NiTi shape memory alloy by PIIID // Materials Letters. — 2006. — Vol. 60, No. 17–18. — P. 2243–2247.
Bahri A., Guermazi N., Elleuch K., Urgen M. Tribological performance of TiN coatings deposited on 304 L stainless steel used for olive-oil extraction // Wear. — 2015. — Vol. 342–343. — P. 77–84.
Gautier C., Machet J. Study of the Growth Mechanisms of Chromium Nitride Films Deposited by Vacuum — Arc Evaporation // Thin Solid Films. — 1997. — Vol. 295, No. 1–2. — P. 43–52.
Zhang Y., Yan P., Wu Z., Zhang P. Influences of deposition parameters on the microstructure and properties of nanostructural TiN films synthesized by filtered cathodic arc plasma // Rare Metals. — 2005. — Vol. 24, No. 4. — P. 370–375.
Белоус В. А., Заднепровский Ю. А., Ломино Н. С., Соболь О. В. Роль аргона в газовой смеси с азотом при получении нитридных конденсатов системы Ti-Si-N в вакуумно-дуговых процессах осаждения // Журнал технической физики. — 2013. — T. 83, вып. 7. — C. 69–76.
Vasyliev V. V., Strelnytskiy V. E. Method and device for transporting vacuum arc plasma, PCT patent application, WO 2012/064311 A1, 18.05.2012.
Welzel U., Ligot J., Lamparter P., Ver meulen A., Mittemeijer E. Stress analysis of polycrystalline thin films and surface regions by X-ray diffraction // J. Appl. Cryst. — 2005. — Vol. 38. — P. 1–29.
Abadias G.. Stress and preferred orientation in nitride-based PVD coatings // Surface and Coatings Technology. — 2008. — Vol. 202, No. 11. — P. 2223–2512.
Davis C. A. A simple model for the formation of compressive stress in thin films by ion bombardment // Thin Solid Films. — 1993. — Vol. 226. — P. 30–34.
Anders A. Cathodic Arcs: From Fractal Spots to Energetic Condensation. — New York: Springer Inc., 2008. — 540 p.
Mukherjee S., Prokert F., Richter E., Moeller W. Intrinsic stress and preferred orientation in TiN coatings deposited on Al using plasma immersion ion implantation assisted deposition // Thin Solid Films. — 2003. — Vol. 445. — P. 48–53.
Anders A., Anders S., Brown I., Dickinson M., MacGill R. Metal plasma immersion ion implantation and deposition using vacuum arc plasma sources // J. Vac. Sci. Technol. — 1994. — B. 12. — P. 815–820.
Bilek M., McKenzie D., Moeller W. Use of low energy and high frequency PBII during thin film deposition to achieve relief of intrinsic stress and microstructural changes // Surface & Coatings Technology. — 2004. — Vol. 186. — P. 21–28.
Akkaya S. S., Vasyliev V. V., Reshetnyak E. N., Kazmanlı K., Solak N., Strel’nitskij V. E., Ürgen M. Structure and properties of TiN coatings produced with PIII&D technique using high efficiency rectilinear filter cathodic arc plasma // Surface & Coatings Technology. — 2013. — Vol. 236. — P. 332–340.
Mayrhofer P., Mitterer C., Hultman L., Clemens H. Microstructural design of hard coatings // Progress in Materials Science. — 2006. — Vol. 51. — P. 1032–1114.
Veprek S., Veprek-Heijman M., Karvankova P., Prochazka J. Different approaches to superhard coatings and nanocomposites // Thin Solid Films. — 2005. — Vol. 476. — P. 1–29.
Lomino N. S., Ovcharenko V. D., Andreev A. A. On Mechanism of Vacuum-Arc Plasma Activation in the Range of Pressures 1–10 Pa // IEEE Transactions on Plasma Science. — 2005. — Vol. 33, No. 5. — P. 1626–1630.
Zhitomirsky V., Kinrot U., Alterkop B., Boxman R. L., Goldsmith S. Influence of gas pressure on the ion current and its distribution in a filtered vacuum arc deposition system // Surface and Coatings Technology. — 1995. — Vol. 86–87. — P. 263–270.
Cheng Y., Zheng Y. Effect of N2/Ar gas flow ratio on the deposition of TiN/Ti coatings on NiTi shape memory alloy by PIIID // Materials Letters. — 2006. — Vol. 60, No. 17–18. — P. 2243–2247.
Bahri A., Guermazi N., Elleuch K., Urgen M. Tribological performance of TiN coatings deposited on 304 L stainless steel used for olive-oil extraction // Wear. — 2015. — Vol. 342–343. — P. 77–84.
Gautier C., Machet J. Study of the Growth Mechanisms of Chromium Nitride Films Deposited by Vacuum — Arc Evaporation // Thin Solid Films. — 1997. — Vol. 295, No. 1–2. — P. 43–52.
Zhang Y., Yan P., Wu Z., Zhang P. Influences of deposition parameters on the microstructure and properties of nanostructural TiN films synthesized by filtered cathodic arc plasma // Rare Metals. — 2005. — Vol. 24, No. 4. — P. 370–375.
Белоус В. А., Заднепровский Ю. А., Ломино Н. С., Соболь О. В. Роль аргона в газовой смеси с азотом при получении нитридных конденсатов системы Ti-Si-N в вакуумно-дуговых процессах осаждения // Журнал технической физики. — 2013. — T. 83, вып. 7. — C. 69–76.
Vasyliev V. V., Strelnytskiy V. E. Method and device for transporting vacuum arc plasma, PCT patent application, WO 2012/064311 A1, 18.05.2012.
Welzel U., Ligot J., Lamparter P., Ver meulen A., Mittemeijer E. Stress analysis of polycrystalline thin films and surface regions by X-ray diffraction // J. Appl. Cryst. — 2005. — Vol. 38. — P. 1–29.
Abadias G.. Stress and preferred orientation in nitride-based PVD coatings // Surface and Coatings Technology. — 2008. — Vol. 202, No. 11. — P. 2223–2512.
Davis C. A. A simple model for the formation of compressive stress in thin films by ion bombardment // Thin Solid Films. — 1993. — Vol. 226. — P. 30–34.
Published
2017-04-27
How to Cite
Васильев, В. В., Лучанинов, А. А., Решетняк, Е. Н., & Стрельницкий, В. Е. (2017). X-ray study of the structure and stress state of TiN coatings deposited from filtered cathodic-arc plasma in the gas mixture N2 with Ar. Journal of Surface Physics and Engineering, 1(4), 387-397. Retrieved from https://periodicals.karazin.ua/pse/article/view/8502
Section
Статті
У відповідності з типовим шаблоном.
