Analisys of synthesis condition of hard tantalum diboride coatings in magnetron sputtering systems
Keywords:
magnetron sputtering systems, tantalum diboride films, deposition conditions, structure, bias potential
Abstract
Study of the synthesis parameters of tantalum diboride thin films obtained in RF and DC magnetron sputtering systems was carried out in this paper. A comparative analysis of the synthesis energy conditions of these films was performed. It was shown that the amount, energy of the ions and neutral particles, participating in the deposition and formation of film on the surface of substrate, changes significantly depending on the method (RF or DC) used for film obtaining, which leads to the formation of coatings in different structural states from an amorphous to nanocrystalline with growth texture perpendicular to the plane (00.1).
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References
Musil J., Baroch P., Vlček J., Nam K. H., Han J. G. Reactive magnetron sputtering of thin films: present status and trends // Thin Solid Films. — 2005. — Vol. 475, No. 1–2. — P. 208–218.
Mattox D. M. Particle bombardment effects on thin-film deposition: A review // J. Vac. Sci. Technol. A. — 1989. — Vol. 7, No. 3. — P. 1105–1114.
Musil J., Vlček J., Baroch P. Magnetron Discharges for Thin Films Plasma Processing. Chapter 3 in Materials Surface Processing by Directed Energy Techniques, Y. Pauleau (Ed.). — Oxford: Elsevier, 2006. — P. 67–106.
Mayrhoffer Р. Н., Mitterer С., Wen J. G., Greene J. E., Petrov J. Self-organized nanocolumnar structure in superhard TiB2 thin films // App. Phys. Lett. — 2005. — Vol. 86, No. 13. — P. 131909–131923.
Mayrhofer P. H., Mitterer C., Clemens H. Selforganized Nanostructures in Hard Ceramic Coa tings // Adv. Eng. Mater. — 2005. — Vol. 7, No. 12. — P. 1071–1082.
Maurhofer P. H., Mitterer C., Wen J. G., Petrov J., Greene J. E. Thermal induced selfhardening of nanocrystalline Ti-B-N films // J. App. Phys. — 2006. — Vol. 100, No. 4. — P. 044301–044308.
Mayrhofer P. H., Stoiber M. Thermal Stability of Superhard Ti-B-N Coatings // Surf. Coat. Technol. — 2007. — Vol. 201, No. 13. — P. 6148–6153.
Bazhin A. I., Goncharov A. A., Pogrebnyak A. D., Stupak V. A., Goncharova S. A., Superhardness Effect in Transition Metal Diborides Films // Phys. Met. Metallogr. — 2016. — Vol. 117, No. 6. — P. 594–601.
Goncharov A. A., Dub S. N., Agulov A. V., Petukhov V. V. Structure, Composition, and Mechanical Properties of Thin Films of Transition Metals Diborides // J. Superhard Mater. — 2015. — Vol. 37, No. 6. — P. 422– 428.
Yakovin S., Zykov A., Dudin S., Farenik V., Goncharov A., Shelest I., Kuznetsov V. Plasma Assisted Deposition of TaB2 Coatings by Magnetron Sputtering System // Probl. At. Sci. Tech. — 2017. — Vol. 107, No. 1. — P. 187– 190.
Goncharov A. A., Volkova G. K., Kono valov V. A., Petukhov V. V. Effect of the substrate on the orientation and structure of thin films obtained by radio-frequency magnetron sputtering of tantalum diboride target //Metallofiz. Noveishie Tekhnol. — 2006. — Vol. 28, No. 12. — P. 1621–1628.
Goncharov A. A., Konovalov V. A., Dub S. N., Stupak V. A., Petukhov V. V. Structure, Composition and Physicomechanical Characteristics of Tantalum Diboride Films // Phys. Met. Metallogr. — 2009. — Vol. 107, No. 3. — P. 285–290.
Kunc F., Musil J., Mayrhofer P. H., Mitterer C. Low-stress superhard Ti-B films prepared by magnetron sputtering // Surf. Coat. Technol. — 2003. — Vol. 174–175. — P. 744–453.
Musil. J. Flexible Hard Nanocomposite Coa tings // RSC Adv. — 2015. — Vol. 5, No. 74. —P. 60482–60495.
Goncharov A. A., Dub S. N., Agulov A. V. Structure, Composition, and Physicomechanical Characteristics of HfB2 and Hf-B-N Films // Phys. Met. Metallogr. — 2013. — Vol. 114, No. 1. — P. 95–101.
Goncharov A. A. Physical Processes of the Formation of Structure and Properties of Films of Transition Metal Diborides // Phys. Met. Metallogr. — 2011. — Vol. 111, No. 3. — P. 314–324.
Mayrhofer P. H., Mitterer C., Hultman L., Clements Н. Microstructural design of hard coatings // Prog. Mater. Sci. — 2006. — Vol. 51, No. 8. — P. 1032–1114.
Lofaj F., Moskalewicz T., Cempura G., Mikula M., Dusza J., Czyrska-Filemonowicz A. Nanohardnes and tribiological properties of ncTiB2 coatings // J. Eur. Ceram. Soc. — 2013. — Vol. 33, No. 12. — P. 2347–2353.
Sanchez C. M. T., Rebollo Plata B., Maia da Costa M. E. H., Freire Jr. F. L. Titanium diboride thin films produced by dc-magnetron sputtering: Structural and mechanical properties // Surf. Coat. Technol. — 2011. — Vol. 205, No. 12. — P. 3698–3702.
Mockute A., Palisaitis J., Alling B., Berastegui P., Broitman E., Näslund L. -Å., Nedfors N., Lu J., Jensen J., Hultman L., Patscheider J., Jansson U., Persson P. O. Å., Rosen J. Age hardening in (Ti1-xAlx)B2 + Δ thin films // Scripta Mater. — 2017. — Vol. 127. — P. 122–126.
Sricharoenchai P., Panich N., Visuttipitukul P., Wangyao P. Effect of Substrate Temperature, Biasing and Sputter Cleaning on the Structure and Properties of Nanostructured TiB2 Coatings on High Speed Steel // Mater. Trans. — 2010. — Vol. 51, No. 2. — P. 246–252.
Lieberman M. A., Lichtenberg A. J. Principles of Plasma Discharges and Materials Processing, 2-nd edition. — Hoboken:Wiley & Son Inc., 2005. — 757 p.
Musil J., Kadlec S. Reactive sputtering of TiN films at large substrate to target distances // Vacuum. — 1990. — Vol. 40, No. 5. — P. 435– 444.
Ellmer K. Magnetron sputtering of transparent con ductive zinc oxide: relation between the sput tering parameters and the electronic properties // J. Phys. D: Appl. Phys. — 2000. — Vol. 33. — P. 17–32.
Petrov I., Hultman L., Sundgren J-E., Greene J. E. Polycrystalline TiN films deposited by reactive bias magnetron sputtering: Effects of ion bombardment on resputtering rates, film composition, and microstructure // J. Vac. Sci. Technol. A. — 1992. — Vol. 10, No. 2. — P. 265–272.
Petrov I., Barna P. B., Hultman L., Greene J. E. Microstructural evolution during film growth // J. Vac. Sci. Technol. A. — 2003. — Vol. 21, No. 5. — P. 117–128.
Jouan P-Y., Lemperier G. Study of a rf planar magnetron sputtering discharge: Discharge characteristics and plasma diagnostics // Vacuum. — 1994. — Vol. 45, No. 1. — P. 89– 95.
Dudin S. V., Farenik V. I., Dahov A. N., Walkowicz J. Development of arc suppression technique for reactive magnetron sputtering // Phys. Surf. Eng. — 2005. — Vol. 3, No. 3–4. — P. 211–215.
Walkowicz J., Zykov A., Dudin S., Yakovin S., Brudnias R. ICP enhanced reactive magnetron sputtering system for syntesis of alumina coating // Tribologia. — 2006. — No. 6. —P. 163–174.
Zykov A. V., Yakovin S. D., Dudin S. V. Syn thesis of dielectric compounds by DC magnetron // Phys. Surf. Eng. — 2009. — Vol. 7, No. 3. — P. 195–203.
Musil. J. Low-pressure magnetron sputtering // Vacuum. — 1998. — Vol. 50, No. 3–4. —
P. 363–372.
Arnell R. D., Kelly P. J. Recent advances in magnetron sputtering // Surf. Coat. Technol. —1999. — Vol. 112, No. 1–3. — P. 170– 176.
Safi I. Recent aspects concerning DC reactive magnetron sputtering of thin films: A review // Surf. Coat. Technol. — 2000. — Vol. 127, No. 2–3. — P. 203–218.
Kelly P. J., Arnell R. D. Magnetron sputtering: a review of recent developments and applications // Vacuum. — 2000. — Vol. 56, No 3. — P. 159–172.
Zykov A. V., Yakovin S. D., Dudin S. V. Synthesis of dielectric compounds by DC magnetron // Phys. Surf. Eng. — 2009. — Vol. 7, No 3. — P. 195–203.
Maishev Yu. P. Ion sources and ion-beam equipment for deposition and etching of materials // Vacuum Tech. Technol. — 1992. — Vol. 2, No. 3–4. — P. 53–58.
Mattox D. M. Particle bombardment effects on thin-film deposition: A review // J. Vac. Sci. Technol. A. — 1989. — Vol. 7, No. 3. — P. 1105–1114.
Musil J., Vlček J., Baroch P. Magnetron Discharges for Thin Films Plasma Processing. Chapter 3 in Materials Surface Processing by Directed Energy Techniques, Y. Pauleau (Ed.). — Oxford: Elsevier, 2006. — P. 67–106.
Mayrhoffer Р. Н., Mitterer С., Wen J. G., Greene J. E., Petrov J. Self-organized nanocolumnar structure in superhard TiB2 thin films // App. Phys. Lett. — 2005. — Vol. 86, No. 13. — P. 131909–131923.
Mayrhofer P. H., Mitterer C., Clemens H. Selforganized Nanostructures in Hard Ceramic Coa tings // Adv. Eng. Mater. — 2005. — Vol. 7, No. 12. — P. 1071–1082.
Maurhofer P. H., Mitterer C., Wen J. G., Petrov J., Greene J. E. Thermal induced selfhardening of nanocrystalline Ti-B-N films // J. App. Phys. — 2006. — Vol. 100, No. 4. — P. 044301–044308.
Mayrhofer P. H., Stoiber M. Thermal Stability of Superhard Ti-B-N Coatings // Surf. Coat. Technol. — 2007. — Vol. 201, No. 13. — P. 6148–6153.
Bazhin A. I., Goncharov A. A., Pogrebnyak A. D., Stupak V. A., Goncharova S. A., Superhardness Effect in Transition Metal Diborides Films // Phys. Met. Metallogr. — 2016. — Vol. 117, No. 6. — P. 594–601.
Goncharov A. A., Dub S. N., Agulov A. V., Petukhov V. V. Structure, Composition, and Mechanical Properties of Thin Films of Transition Metals Diborides // J. Superhard Mater. — 2015. — Vol. 37, No. 6. — P. 422– 428.
Yakovin S., Zykov A., Dudin S., Farenik V., Goncharov A., Shelest I., Kuznetsov V. Plasma Assisted Deposition of TaB2 Coatings by Magnetron Sputtering System // Probl. At. Sci. Tech. — 2017. — Vol. 107, No. 1. — P. 187– 190.
Goncharov A. A., Volkova G. K., Kono valov V. A., Petukhov V. V. Effect of the substrate on the orientation and structure of thin films obtained by radio-frequency magnetron sputtering of tantalum diboride target //Metallofiz. Noveishie Tekhnol. — 2006. — Vol. 28, No. 12. — P. 1621–1628.
Goncharov A. A., Konovalov V. A., Dub S. N., Stupak V. A., Petukhov V. V. Structure, Composition and Physicomechanical Characteristics of Tantalum Diboride Films // Phys. Met. Metallogr. — 2009. — Vol. 107, No. 3. — P. 285–290.
Kunc F., Musil J., Mayrhofer P. H., Mitterer C. Low-stress superhard Ti-B films prepared by magnetron sputtering // Surf. Coat. Technol. — 2003. — Vol. 174–175. — P. 744–453.
Musil. J. Flexible Hard Nanocomposite Coa tings // RSC Adv. — 2015. — Vol. 5, No. 74. —P. 60482–60495.
Goncharov A. A., Dub S. N., Agulov A. V. Structure, Composition, and Physicomechanical Characteristics of HfB2 and Hf-B-N Films // Phys. Met. Metallogr. — 2013. — Vol. 114, No. 1. — P. 95–101.
Goncharov A. A. Physical Processes of the Formation of Structure and Properties of Films of Transition Metal Diborides // Phys. Met. Metallogr. — 2011. — Vol. 111, No. 3. — P. 314–324.
Mayrhofer P. H., Mitterer C., Hultman L., Clements Н. Microstructural design of hard coatings // Prog. Mater. Sci. — 2006. — Vol. 51, No. 8. — P. 1032–1114.
Lofaj F., Moskalewicz T., Cempura G., Mikula M., Dusza J., Czyrska-Filemonowicz A. Nanohardnes and tribiological properties of ncTiB2 coatings // J. Eur. Ceram. Soc. — 2013. — Vol. 33, No. 12. — P. 2347–2353.
Sanchez C. M. T., Rebollo Plata B., Maia da Costa M. E. H., Freire Jr. F. L. Titanium diboride thin films produced by dc-magnetron sputtering: Structural and mechanical properties // Surf. Coat. Technol. — 2011. — Vol. 205, No. 12. — P. 3698–3702.
Mockute A., Palisaitis J., Alling B., Berastegui P., Broitman E., Näslund L. -Å., Nedfors N., Lu J., Jensen J., Hultman L., Patscheider J., Jansson U., Persson P. O. Å., Rosen J. Age hardening in (Ti1-xAlx)B2 + Δ thin films // Scripta Mater. — 2017. — Vol. 127. — P. 122–126.
Sricharoenchai P., Panich N., Visuttipitukul P., Wangyao P. Effect of Substrate Temperature, Biasing and Sputter Cleaning on the Structure and Properties of Nanostructured TiB2 Coatings on High Speed Steel // Mater. Trans. — 2010. — Vol. 51, No. 2. — P. 246–252.
Lieberman M. A., Lichtenberg A. J. Principles of Plasma Discharges and Materials Processing, 2-nd edition. — Hoboken:Wiley & Son Inc., 2005. — 757 p.
Musil J., Kadlec S. Reactive sputtering of TiN films at large substrate to target distances // Vacuum. — 1990. — Vol. 40, No. 5. — P. 435– 444.
Ellmer K. Magnetron sputtering of transparent con ductive zinc oxide: relation between the sput tering parameters and the electronic properties // J. Phys. D: Appl. Phys. — 2000. — Vol. 33. — P. 17–32.
Petrov I., Hultman L., Sundgren J-E., Greene J. E. Polycrystalline TiN films deposited by reactive bias magnetron sputtering: Effects of ion bombardment on resputtering rates, film composition, and microstructure // J. Vac. Sci. Technol. A. — 1992. — Vol. 10, No. 2. — P. 265–272.
Petrov I., Barna P. B., Hultman L., Greene J. E. Microstructural evolution during film growth // J. Vac. Sci. Technol. A. — 2003. — Vol. 21, No. 5. — P. 117–128.
Jouan P-Y., Lemperier G. Study of a rf planar magnetron sputtering discharge: Discharge characteristics and plasma diagnostics // Vacuum. — 1994. — Vol. 45, No. 1. — P. 89– 95.
Dudin S. V., Farenik V. I., Dahov A. N., Walkowicz J. Development of arc suppression technique for reactive magnetron sputtering // Phys. Surf. Eng. — 2005. — Vol. 3, No. 3–4. — P. 211–215.
Walkowicz J., Zykov A., Dudin S., Yakovin S., Brudnias R. ICP enhanced reactive magnetron sputtering system for syntesis of alumina coating // Tribologia. — 2006. — No. 6. —P. 163–174.
Zykov A. V., Yakovin S. D., Dudin S. V. Syn thesis of dielectric compounds by DC magnetron // Phys. Surf. Eng. — 2009. — Vol. 7, No. 3. — P. 195–203.
Musil. J. Low-pressure magnetron sputtering // Vacuum. — 1998. — Vol. 50, No. 3–4. —
P. 363–372.
Arnell R. D., Kelly P. J. Recent advances in magnetron sputtering // Surf. Coat. Technol. —1999. — Vol. 112, No. 1–3. — P. 170– 176.
Safi I. Recent aspects concerning DC reactive magnetron sputtering of thin films: A review // Surf. Coat. Technol. — 2000. — Vol. 127, No. 2–3. — P. 203–218.
Kelly P. J., Arnell R. D. Magnetron sputtering: a review of recent developments and applications // Vacuum. — 2000. — Vol. 56, No 3. — P. 159–172.
Zykov A. V., Yakovin S. D., Dudin S. V. Synthesis of dielectric compounds by DC magnetron // Phys. Surf. Eng. — 2009. — Vol. 7, No 3. — P. 195–203.
Maishev Yu. P. Ion sources and ion-beam equipment for deposition and etching of materials // Vacuum Tech. Technol. — 1992. — Vol. 2, No. 3–4. — P. 53–58.
Published
2017-11-14
How to Cite
Гончаров, А. А., Юнда, А. Н., Зыков, А. В., Фареник, В. И., Шелест, И. В., & Буранич, В. В. (2017). Analisys of synthesis condition of hard tantalum diboride coatings in magnetron sputtering systems. Journal of Surface Physics and Engineering, 2(2-3), 105- 114. Retrieved from https://periodicals.karazin.ua/pse/article/view/9573
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