Синтез алмазу у НВЧ плазмі: обладнання, плівки, застосування
Ключові слова:
алмаз, плівки, CVD синтез, монокристалічний, полікристалічний
Анотація
Виконано короткий огляд розвитку робіт з синтезу алмазних покрить із плазми газового розряду в НВЧ пристроях (метод MW CVD – microwave plasma chemical vapor deposition). Розглянуті існуючі НВЧ пристрої для алмазного синтезу, а також методи комп’ютерного моделювання нових пристроїв і процесів, які відбуваються в них. Описані деякі методи гомоепітаксіального нарощування монокристалічного алмазу на алмазних підкладках. Також наведені приклади отримання полікристалічних і наноструктурних алмазних плівок на неалмазних підкладках методом гетероепітаксіального зростання і розглянуто залежність особливостей структури плівок від складу вихідної газової суміші та умов осадження в НВЧ реакторах. Розглянуто приклади отримання високоорієнтованих полікристалічних алмазних плівок (HOD – highly oriented diamond), які за багатьма властивостями близькі до монокристалів алмазу і показані деякі приклади практичного застосування синтезованих алмазних плівок.
Завантаження
##plugins.generic.usageStats.noStats##
Посилання
Kamo M., Sato Y., Matsumoto S., Setaka N. Diamond Synthesis from Gas Phase in Micro-wave Plasma// Journal of Crystal Growth. – 1983. – Vol. 62. – P. 642-644.
Matsumoto S., Sato Y., Kamo M., Setaka N. Vapor Deposition of Diamond Particles from
Methane//J. Appl. Phys. – 1982. – Vol. 21. – P. L183.
Wolter S.D., Okuzumi F., Prater J.T., Sitar Z. AC vs. DC Bias-Enhanced Nucleation of Highly Oriented Diamond on Silicon (100)//J. of the Electrochemical Society. – 2002. – Vol. 149 (2). – P. G114-G117.
Volkov Yu.Ya., Ushakov V.A., Zalesskij D.Yu., Kushnir V.A., Strel’nickij V.E. Modelirovanie rezonatornoj kamery i topologii ‘elektricheskogo polya SVCh reaktora dlya polucheniya almaznyh pokrytij//Mat. 5 Mіzhnar. nauk. konf. “Fіzikohіmіchnі osnovi formuvannya і modifіkacії mіkrota nanostruktur” (Harkіv, Ukraina). – 2011. – T. 1. – S. 98-103.
Tan W., Grotjohn T.A. Modeling the Electromagnetic Field and Plasma Discharge in a Microwave Plasma Diamond Deposition Reactor//Diamond & Related Materials. – 1995. – Vol. 4. – P. 1145-1154.
Yamada H., Chayahara A., Mokuno Y., Soda Y., Horino Y., Fujimori N. Numerical Analysis of Power Absorption and Gas Pressure Dependence of Microwave Plasma Using a Tractable Plasma Description//Diamond&Related Materials. – 2006. - Vol. 15. - P. 1395-1399.
Yamada H., Chayahara A., Mokuno Y., Soda Y. Sikata Si. Simulation with an Improved Plasma Model Utilized to Design a New Structure of Microwave Plasma Discharge for Chemical Vapor Deposition of Diamond Crystals//Diamond& Related Materials.–2008.–Vol. 17. – P. 494-497.
Fuji K., Sumimoto T., Hatta A. Diamond Synthesis by Microwave and DC Hybrid Plasma CVD// NASA/CP – 2001-210948, Proceedings of the Sixth Applied Diamond Conf./Second Frontier Carbon Technology Joint Conf. (ADC/FCT 2001). – 2001. – P. 348.
Fhner M., Wild C., Koidl P. Novel Microwave Plasma Reactor for Diamond Synthesis//Appl. Phys. Letters. – 1998. – Vol. 72, No. 10. – P. 1149-1151.
Fhner M., Wild C., Koidl P. Simulation and Development of Optimized Microwave Plasma Reactors for Diamond Deposition//Surface and Coatings Technology. – 1999. – Vol. 116-119. – P. 853-862.
Fhner M., Wild C., Koidl P. Numerical Simulations of Microwave Plasma Reactors for Diamond CVD// Surface and Coatings Technology. – 1995. – Vol. 74-75. – P. 221-226.
Silva F., Bonnin X., Scharpf J. A. Pasquarelli, Microwave Analysis of PACVD Diamond Deposition Reactor Based on Electromagnetic Modeling//Diamond & Related Materials. – 2010. – Vol. 19. – P. 397-403.
Yamada H., Chayahara A., Mokuno Y., Soda Y., Horino Y., Shikata S. Simulation of Microwave Plasmas Concentrated on the Top Surface of a Diamond Substrate with Finite Thickness//Diamond&Related Materials. – 2006. – Vol. 15. – P. 1383-1388.
Yamada H., Chayahara A., Mokuno Y., Horino Y., Shikata S. Numerical Analyses of a Microwave Plasma Chemical Vapor Deposition Reactor for Thick Diamond Syntheses//Diamond & Related Materials. – 2006. – Vol. 15. – P. 1389-1394.
Yamada H., Mokuno Y., Chayahara A., Horino Y., Shikata S. Predominant Physical Quantity Dominating Macroscopic Surface Shape of Diamond Synthesized by Microwave Plasma CVD //Diamond&Related Materials. – 2007. – Vol. 16. – P. 576-580.
Mankelevich Yu.A., May P.W., Allan N.L., Ashfold M.N.R., Richley J.C. Simulations of Polycrystalline CVD Diamond Film Growth Using a Simplified Monte Carlo Model//Diamond & Related Materials. – 2010. – Vol. 19. – P. 389-396.
Mankelevich Yu.A., May P.W. New Insights into the Mechanism of CVD Diamond Growth: Single Crystal Diamond in MW PECVD Reactors// Diamond & Related Materials. – 2008. – Vol. 17. – P. 1021-1028.
Kobashi K., Nishimura K., Kawate Y., Horiuchi T. Synthesis of Diamonds by use of Microwave Plasma Chemical-vapor Deposition: Morphology and Growth of Diamond Films//Physical Review B. – 1988. – Vol. 38, No. 6. – P. 11.
Setaka N. Hyomen//Surface (in Japanese). – 1984. – Vol. 22. – P. 110.
Mankelevich Yu.A., Ashfold M.N.R., Ma Jie. Plasma-chemical Processes in Microwave Plasma-enhanced Chemical Vapor Deposition Reactors Operating with C/H/Ar Gas Mixtures//J. Appl. Phys. – 2008. – Vol. 104. – P. 113304.
Zhou D., Gruen D.M., Qin L.C., McCauley T.G., and Krauss A.R. Control of diamond film microstructure by Ar additions to CH4/H2 microwave plasmas//J. Appl. Phys. – 1998. – Vol. 84. – P. 1981.
King D., Yaran M.K., Schuelke T., Grotjohn T.A., Reinhard D.K., Asmussen J. Scaling the Microwave Plasma-assisted Chemical Vapor Diamond Deposition Process to 150 – 200 mm Substrates //Diamond&Related Materials.–2008.– Vol. 17. – P. 520-524.
Kobashi K., Yokota Y. R&D of Diamond Films in Kobe Steel//Proceedings of the Sixth Applied Diamond Conf./Second Frontier Carbon Technology Joint Conference (ADC/FCT 2001). – 2001. – P. 24-30.
Han S.K., McClure M.T., Wolden C.A., Vlahovic B., Soldi A., Sitar S. Fabrication and Testing of a Microstrip Particle Detector Based on Highly Oriented Diamond Films//Diamond&Related Materials. – 2000. – Vol. 9. – P. 1008-1012.
Mokuno Y., Chayahara A., Soda Y., Horino Y., Fujimori N. Synthesizing Single-crystal Diamond by Repetition of High Rate Homoepitaxial Growth by Microwave Plasma CVD//Diamond & Related Materials. – 2005. – Vol. 14. – P. 1743-1746.
Bogdan G., Neslaўdek M., D’Haen J., Haenen K., D’Olieslaeger M. Freestanding (100) Homoepitaxial CVD Diamond//Diamond & Related Materials. – 2006. – Vol. 15. – P. 508-512.
Tzeng Y., Wei J., Woo J.T., Lanford W. Freestanding Single-crystalline Chemically vapor Deposited Diamond Films//2216 Appl. Phys. Lett. – 1993. – Vol. 63. – P. 6.
Bauer T., Schreck M., Sternschulte H., Stritzker B. High Growth Rate Homoepitaxial Diamond Deposition on Off-axis Substrates//Diamond & Related Materials. – 2005. – Vol. 14. – P. 266-271.
Teraji T., Hamada M., Wada H., Yamamoto M., Ito T. High-quality Homoepitaxial Diamond (100) Films Grown under High-rate Growth Condition //Diamond&Related Materials. – 2005. – Vol. 14. – P. 1747- 1752.
Teraji T., Hamada M., Wada H., Yamamoto M., Arima K., Ito T. High Rate Growth and Electrical/ optical Properties of High-quality Homoepitaxial Diamond (100) Films//Diamond&Related Materials. – 2005. – Vol. 14. – P. 255-260.
Tallaire A., Achard J., Silva F., Sussmann R.S., Gicquel A. Homoepitaxial Deposition of Highquality Thick Diamond Films: Effect of Growth Parametrs//Diamond&Related Materials. – 2005. – Vol. 14. – P. 249-254.
Maida O., Miyatake H., Teraji T., Ito T. Characterization of Substrate Off-angle Effects for Highquality Homoepitaxial CVD Diamond Films// Diamond&Related Materials. – 2008. – Vol. 17. – P. 435-439.
Harris S.J., Goodwin D.G. Growth on the reconstructed diamond (100) surface//J. Phys. Chem. – 1993. – Vol. 97. – P. 23.
Tamura H., Zhou H., Hirano Y., Takami S., Kubo M., Beloskov R., Miyamoto A., Imamura A., Gamo M., Ando T. First-Principle Study on Reactions of Diamond (100) Surfaces with Hydrogen and Methyl Radicals//Phys. Rev. B. – 2000. – Vol. 62. – P. 16995.
New Diamond&Frontier Carbon Technology. – 1999. – Vol. 9, No. 3, 4.
Matsumoto S., Sato Y., Kamo M., Setaka N. Vapor Deposition of Diamond Particles from
Methane//J. Appl. Phys. – 1982. – Vol. 21. – P. L183.
Wolter S.D., Okuzumi F., Prater J.T., Sitar Z. AC vs. DC Bias-Enhanced Nucleation of Highly Oriented Diamond on Silicon (100)//J. of the Electrochemical Society. – 2002. – Vol. 149 (2). – P. G114-G117.
Volkov Yu.Ya., Ushakov V.A., Zalesskij D.Yu., Kushnir V.A., Strel’nickij V.E. Modelirovanie rezonatornoj kamery i topologii ‘elektricheskogo polya SVCh reaktora dlya polucheniya almaznyh pokrytij//Mat. 5 Mіzhnar. nauk. konf. “Fіzikohіmіchnі osnovi formuvannya і modifіkacії mіkrota nanostruktur” (Harkіv, Ukraina). – 2011. – T. 1. – S. 98-103.
Tan W., Grotjohn T.A. Modeling the Electromagnetic Field and Plasma Discharge in a Microwave Plasma Diamond Deposition Reactor//Diamond & Related Materials. – 1995. – Vol. 4. – P. 1145-1154.
Yamada H., Chayahara A., Mokuno Y., Soda Y., Horino Y., Fujimori N. Numerical Analysis of Power Absorption and Gas Pressure Dependence of Microwave Plasma Using a Tractable Plasma Description//Diamond&Related Materials. – 2006. - Vol. 15. - P. 1395-1399.
Yamada H., Chayahara A., Mokuno Y., Soda Y. Sikata Si. Simulation with an Improved Plasma Model Utilized to Design a New Structure of Microwave Plasma Discharge for Chemical Vapor Deposition of Diamond Crystals//Diamond& Related Materials.–2008.–Vol. 17. – P. 494-497.
Fuji K., Sumimoto T., Hatta A. Diamond Synthesis by Microwave and DC Hybrid Plasma CVD// NASA/CP – 2001-210948, Proceedings of the Sixth Applied Diamond Conf./Second Frontier Carbon Technology Joint Conf. (ADC/FCT 2001). – 2001. – P. 348.
Fhner M., Wild C., Koidl P. Novel Microwave Plasma Reactor for Diamond Synthesis//Appl. Phys. Letters. – 1998. – Vol. 72, No. 10. – P. 1149-1151.
Fhner M., Wild C., Koidl P. Simulation and Development of Optimized Microwave Plasma Reactors for Diamond Deposition//Surface and Coatings Technology. – 1999. – Vol. 116-119. – P. 853-862.
Fhner M., Wild C., Koidl P. Numerical Simulations of Microwave Plasma Reactors for Diamond CVD// Surface and Coatings Technology. – 1995. – Vol. 74-75. – P. 221-226.
Silva F., Bonnin X., Scharpf J. A. Pasquarelli, Microwave Analysis of PACVD Diamond Deposition Reactor Based on Electromagnetic Modeling//Diamond & Related Materials. – 2010. – Vol. 19. – P. 397-403.
Yamada H., Chayahara A., Mokuno Y., Soda Y., Horino Y., Shikata S. Simulation of Microwave Plasmas Concentrated on the Top Surface of a Diamond Substrate with Finite Thickness//Diamond&Related Materials. – 2006. – Vol. 15. – P. 1383-1388.
Yamada H., Chayahara A., Mokuno Y., Horino Y., Shikata S. Numerical Analyses of a Microwave Plasma Chemical Vapor Deposition Reactor for Thick Diamond Syntheses//Diamond & Related Materials. – 2006. – Vol. 15. – P. 1389-1394.
Yamada H., Mokuno Y., Chayahara A., Horino Y., Shikata S. Predominant Physical Quantity Dominating Macroscopic Surface Shape of Diamond Synthesized by Microwave Plasma CVD //Diamond&Related Materials. – 2007. – Vol. 16. – P. 576-580.
Mankelevich Yu.A., May P.W., Allan N.L., Ashfold M.N.R., Richley J.C. Simulations of Polycrystalline CVD Diamond Film Growth Using a Simplified Monte Carlo Model//Diamond & Related Materials. – 2010. – Vol. 19. – P. 389-396.
Mankelevich Yu.A., May P.W. New Insights into the Mechanism of CVD Diamond Growth: Single Crystal Diamond in MW PECVD Reactors// Diamond & Related Materials. – 2008. – Vol. 17. – P. 1021-1028.
Kobashi K., Nishimura K., Kawate Y., Horiuchi T. Synthesis of Diamonds by use of Microwave Plasma Chemical-vapor Deposition: Morphology and Growth of Diamond Films//Physical Review B. – 1988. – Vol. 38, No. 6. – P. 11.
Setaka N. Hyomen//Surface (in Japanese). – 1984. – Vol. 22. – P. 110.
Mankelevich Yu.A., Ashfold M.N.R., Ma Jie. Plasma-chemical Processes in Microwave Plasma-enhanced Chemical Vapor Deposition Reactors Operating with C/H/Ar Gas Mixtures//J. Appl. Phys. – 2008. – Vol. 104. – P. 113304.
Zhou D., Gruen D.M., Qin L.C., McCauley T.G., and Krauss A.R. Control of diamond film microstructure by Ar additions to CH4/H2 microwave plasmas//J. Appl. Phys. – 1998. – Vol. 84. – P. 1981.
King D., Yaran M.K., Schuelke T., Grotjohn T.A., Reinhard D.K., Asmussen J. Scaling the Microwave Plasma-assisted Chemical Vapor Diamond Deposition Process to 150 – 200 mm Substrates //Diamond&Related Materials.–2008.– Vol. 17. – P. 520-524.
Kobashi K., Yokota Y. R&D of Diamond Films in Kobe Steel//Proceedings of the Sixth Applied Diamond Conf./Second Frontier Carbon Technology Joint Conference (ADC/FCT 2001). – 2001. – P. 24-30.
Han S.K., McClure M.T., Wolden C.A., Vlahovic B., Soldi A., Sitar S. Fabrication and Testing of a Microstrip Particle Detector Based on Highly Oriented Diamond Films//Diamond&Related Materials. – 2000. – Vol. 9. – P. 1008-1012.
Mokuno Y., Chayahara A., Soda Y., Horino Y., Fujimori N. Synthesizing Single-crystal Diamond by Repetition of High Rate Homoepitaxial Growth by Microwave Plasma CVD//Diamond & Related Materials. – 2005. – Vol. 14. – P. 1743-1746.
Bogdan G., Neslaўdek M., D’Haen J., Haenen K., D’Olieslaeger M. Freestanding (100) Homoepitaxial CVD Diamond//Diamond & Related Materials. – 2006. – Vol. 15. – P. 508-512.
Tzeng Y., Wei J., Woo J.T., Lanford W. Freestanding Single-crystalline Chemically vapor Deposited Diamond Films//2216 Appl. Phys. Lett. – 1993. – Vol. 63. – P. 6.
Bauer T., Schreck M., Sternschulte H., Stritzker B. High Growth Rate Homoepitaxial Diamond Deposition on Off-axis Substrates//Diamond & Related Materials. – 2005. – Vol. 14. – P. 266-271.
Teraji T., Hamada M., Wada H., Yamamoto M., Ito T. High-quality Homoepitaxial Diamond (100) Films Grown under High-rate Growth Condition //Diamond&Related Materials. – 2005. – Vol. 14. – P. 1747- 1752.
Teraji T., Hamada M., Wada H., Yamamoto M., Arima K., Ito T. High Rate Growth and Electrical/ optical Properties of High-quality Homoepitaxial Diamond (100) Films//Diamond&Related Materials. – 2005. – Vol. 14. – P. 255-260.
Tallaire A., Achard J., Silva F., Sussmann R.S., Gicquel A. Homoepitaxial Deposition of Highquality Thick Diamond Films: Effect of Growth Parametrs//Diamond&Related Materials. – 2005. – Vol. 14. – P. 249-254.
Maida O., Miyatake H., Teraji T., Ito T. Characterization of Substrate Off-angle Effects for Highquality Homoepitaxial CVD Diamond Films// Diamond&Related Materials. – 2008. – Vol. 17. – P. 435-439.
Harris S.J., Goodwin D.G. Growth on the reconstructed diamond (100) surface//J. Phys. Chem. – 1993. – Vol. 97. – P. 23.
Tamura H., Zhou H., Hirano Y., Takami S., Kubo M., Beloskov R., Miyamoto A., Imamura A., Gamo M., Ando T. First-Principle Study on Reactions of Diamond (100) Surfaces with Hydrogen and Methyl Radicals//Phys. Rev. B. – 2000. – Vol. 62. – P. 16995.
New Diamond&Frontier Carbon Technology. – 1999. – Vol. 9, No. 3, 4.
Опубліковано
2017-07-28
Як цитувати
Волков, Ю. Я., Стрельницкий, В. Е., & Ушаков, В. А. (2017). Синтез алмазу у НВЧ плазмі: обладнання, плівки, застосування. Журнал фізики та інженерії поверхні, 11(1), 26 - 45. вилучено із https://periodicals.karazin.ua/pse/article/view/8784
Розділ
Статті
У відповідності з типовим шаблоном.
