Synthesis of diamond in microwave plasma: equipment, films, application
Keywords:
diamond, films, CVD synthesis, monocrystalline, polycrystalline
Abstract
In this paper we present a brief review of advancement in the diamond synthesis by microwave plasma chemical vapor deposition (MW CVD) methods. The most prevalent MW CVD devices for diamond synthesis are described, as well as some of the computational modeling methods of a new devices and interaction between MW fields and plasmas during deposition processes are discussed. One can find here a description of some methods of a single-crystal homoepitaxial diamond growth on the diamond substrates and several examples of a heteroepitaxial MW CVD deposition of a polycrystalline diamond films on a non-diamond substrates. We also examined a number of works dealing with a deposition of highly oriented polycrystalline diamond films (HOD) which shows characteristics close to single-crystal diamond. And in the end we gave a number of examples of the grown diamond films applications in industry and electronics.
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References
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Tallaire A., Achard J., Silva F., Sussmann R.S., Gicquel A. Homoepitaxial Deposition of Highquality Thick Diamond Films: Effect of Growth Parametrs//Diamond&Related Materials. – 2005. – Vol. 14. – P. 249-254.
Maida O., Miyatake H., Teraji T., Ito T. Characterization of Substrate Off-angle Effects for Highquality Homoepitaxial CVD Diamond Films// Diamond&Related Materials. – 2008. – Vol. 17. – P. 435-439.
Harris S.J., Goodwin D.G. Growth on the reconstructed diamond (100) surface//J. Phys. Chem. – 1993. – Vol. 97. – P. 23.
Tamura H., Zhou H., Hirano Y., Takami S., Kubo M., Beloskov R., Miyamoto A., Imamura A., Gamo M., Ando T. First-Principle Study on Reactions of Diamond (100) Surfaces with Hydrogen and Methyl Radicals//Phys. Rev. B. – 2000. – Vol. 62. – P. 16995.
New Diamond&Frontier Carbon Technology. – 1999. – Vol. 9, No. 3, 4.
Matsumoto S., Sato Y., Kamo M., Setaka N. Vapor Deposition of Diamond Particles from
Methane//J. Appl. Phys. – 1982. – Vol. 21. – P. L183.
Wolter S.D., Okuzumi F., Prater J.T., Sitar Z. AC vs. DC Bias-Enhanced Nucleation of Highly Oriented Diamond on Silicon (100)//J. of the Electrochemical Society. – 2002. – Vol. 149 (2). – P. G114-G117.
Volkov Yu.Ya., Ushakov V.A., Zalesskij D.Yu., Kushnir V.A., Strel’nickij V.E. Modelirovanie rezonatornoj kamery i topologii ‘elektricheskogo polya SVCh reaktora dlya polucheniya almaznyh pokrytij//Mat. 5 Mіzhnar. nauk. konf. “Fіzikohіmіchnі osnovi formuvannya і modifіkacії mіkrota nanostruktur” (Harkіv, Ukraina). – 2011. – T. 1. – S. 98-103.
Tan W., Grotjohn T.A. Modeling the Electromagnetic Field and Plasma Discharge in a Microwave Plasma Diamond Deposition Reactor//Diamond & Related Materials. – 1995. – Vol. 4. – P. 1145-1154.
Yamada H., Chayahara A., Mokuno Y., Soda Y., Horino Y., Fujimori N. Numerical Analysis of Power Absorption and Gas Pressure Dependence of Microwave Plasma Using a Tractable Plasma Description//Diamond&Related Materials. – 2006. - Vol. 15. - P. 1395-1399.
Yamada H., Chayahara A., Mokuno Y., Soda Y. Sikata Si. Simulation with an Improved Plasma Model Utilized to Design a New Structure of Microwave Plasma Discharge for Chemical Vapor Deposition of Diamond Crystals//Diamond& Related Materials.–2008.–Vol. 17. – P. 494-497.
Fuji K., Sumimoto T., Hatta A. Diamond Synthesis by Microwave and DC Hybrid Plasma CVD// NASA/CP – 2001-210948, Proceedings of the Sixth Applied Diamond Conf./Second Frontier Carbon Technology Joint Conf. (ADC/FCT 2001). – 2001. – P. 348.
Fhner M., Wild C., Koidl P. Novel Microwave Plasma Reactor for Diamond Synthesis//Appl. Phys. Letters. – 1998. – Vol. 72, No. 10. – P. 1149-1151.
Fhner M., Wild C., Koidl P. Simulation and Development of Optimized Microwave Plasma Reactors for Diamond Deposition//Surface and Coatings Technology. – 1999. – Vol. 116-119. – P. 853-862.
Fhner M., Wild C., Koidl P. Numerical Simulations of Microwave Plasma Reactors for Diamond CVD// Surface and Coatings Technology. – 1995. – Vol. 74-75. – P. 221-226.
Silva F., Bonnin X., Scharpf J. A. Pasquarelli, Microwave Analysis of PACVD Diamond Deposition Reactor Based on Electromagnetic Modeling//Diamond & Related Materials. – 2010. – Vol. 19. – P. 397-403.
Yamada H., Chayahara A., Mokuno Y., Soda Y., Horino Y., Shikata S. Simulation of Microwave Plasmas Concentrated on the Top Surface of a Diamond Substrate with Finite Thickness//Diamond&Related Materials. – 2006. – Vol. 15. – P. 1383-1388.
Yamada H., Chayahara A., Mokuno Y., Horino Y., Shikata S. Numerical Analyses of a Microwave Plasma Chemical Vapor Deposition Reactor for Thick Diamond Syntheses//Diamond & Related Materials. – 2006. – Vol. 15. – P. 1389-1394.
Yamada H., Mokuno Y., Chayahara A., Horino Y., Shikata S. Predominant Physical Quantity Dominating Macroscopic Surface Shape of Diamond Synthesized by Microwave Plasma CVD //Diamond&Related Materials. – 2007. – Vol. 16. – P. 576-580.
Mankelevich Yu.A., May P.W., Allan N.L., Ashfold M.N.R., Richley J.C. Simulations of Polycrystalline CVD Diamond Film Growth Using a Simplified Monte Carlo Model//Diamond & Related Materials. – 2010. – Vol. 19. – P. 389-396.
Mankelevich Yu.A., May P.W. New Insights into the Mechanism of CVD Diamond Growth: Single Crystal Diamond in MW PECVD Reactors// Diamond & Related Materials. – 2008. – Vol. 17. – P. 1021-1028.
Kobashi K., Nishimura K., Kawate Y., Horiuchi T. Synthesis of Diamonds by use of Microwave Plasma Chemical-vapor Deposition: Morphology and Growth of Diamond Films//Physical Review B. – 1988. – Vol. 38, No. 6. – P. 11.
Setaka N. Hyomen//Surface (in Japanese). – 1984. – Vol. 22. – P. 110.
Mankelevich Yu.A., Ashfold M.N.R., Ma Jie. Plasma-chemical Processes in Microwave Plasma-enhanced Chemical Vapor Deposition Reactors Operating with C/H/Ar Gas Mixtures//J. Appl. Phys. – 2008. – Vol. 104. – P. 113304.
Zhou D., Gruen D.M., Qin L.C., McCauley T.G., and Krauss A.R. Control of diamond film microstructure by Ar additions to CH4/H2 microwave plasmas//J. Appl. Phys. – 1998. – Vol. 84. – P. 1981.
King D., Yaran M.K., Schuelke T., Grotjohn T.A., Reinhard D.K., Asmussen J. Scaling the Microwave Plasma-assisted Chemical Vapor Diamond Deposition Process to 150 – 200 mm Substrates //Diamond&Related Materials.–2008.– Vol. 17. – P. 520-524.
Kobashi K., Yokota Y. R&D of Diamond Films in Kobe Steel//Proceedings of the Sixth Applied Diamond Conf./Second Frontier Carbon Technology Joint Conference (ADC/FCT 2001). – 2001. – P. 24-30.
Han S.K., McClure M.T., Wolden C.A., Vlahovic B., Soldi A., Sitar S. Fabrication and Testing of a Microstrip Particle Detector Based on Highly Oriented Diamond Films//Diamond&Related Materials. – 2000. – Vol. 9. – P. 1008-1012.
Mokuno Y., Chayahara A., Soda Y., Horino Y., Fujimori N. Synthesizing Single-crystal Diamond by Repetition of High Rate Homoepitaxial Growth by Microwave Plasma CVD//Diamond & Related Materials. – 2005. – Vol. 14. – P. 1743-1746.
Bogdan G., Neslaўdek M., D’Haen J., Haenen K., D’Olieslaeger M. Freestanding (100) Homoepitaxial CVD Diamond//Diamond & Related Materials. – 2006. – Vol. 15. – P. 508-512.
Tzeng Y., Wei J., Woo J.T., Lanford W. Freestanding Single-crystalline Chemically vapor Deposited Diamond Films//2216 Appl. Phys. Lett. – 1993. – Vol. 63. – P. 6.
Bauer T., Schreck M., Sternschulte H., Stritzker B. High Growth Rate Homoepitaxial Diamond Deposition on Off-axis Substrates//Diamond & Related Materials. – 2005. – Vol. 14. – P. 266-271.
Teraji T., Hamada M., Wada H., Yamamoto M., Ito T. High-quality Homoepitaxial Diamond (100) Films Grown under High-rate Growth Condition //Diamond&Related Materials. – 2005. – Vol. 14. – P. 1747- 1752.
Teraji T., Hamada M., Wada H., Yamamoto M., Arima K., Ito T. High Rate Growth and Electrical/ optical Properties of High-quality Homoepitaxial Diamond (100) Films//Diamond&Related Materials. – 2005. – Vol. 14. – P. 255-260.
Tallaire A., Achard J., Silva F., Sussmann R.S., Gicquel A. Homoepitaxial Deposition of Highquality Thick Diamond Films: Effect of Growth Parametrs//Diamond&Related Materials. – 2005. – Vol. 14. – P. 249-254.
Maida O., Miyatake H., Teraji T., Ito T. Characterization of Substrate Off-angle Effects for Highquality Homoepitaxial CVD Diamond Films// Diamond&Related Materials. – 2008. – Vol. 17. – P. 435-439.
Harris S.J., Goodwin D.G. Growth on the reconstructed diamond (100) surface//J. Phys. Chem. – 1993. – Vol. 97. – P. 23.
Tamura H., Zhou H., Hirano Y., Takami S., Kubo M., Beloskov R., Miyamoto A., Imamura A., Gamo M., Ando T. First-Principle Study on Reactions of Diamond (100) Surfaces with Hydrogen and Methyl Radicals//Phys. Rev. B. – 2000. – Vol. 62. – P. 16995.
New Diamond&Frontier Carbon Technology. – 1999. – Vol. 9, No. 3, 4.
Published
2017-07-28
How to Cite
Волков, Ю. Я., Стрельницкий, В. Е., & Ушаков, В. А. (2017). Synthesis of diamond in microwave plasma: equipment, films, application. Journal of Surface Physics and Engineering, 11(1), 26 - 45. Retrieved from https://periodicals.karazin.ua/pse/article/view/8784
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