Comparative Effects of Cold Plasma and Thermal Annealing on the Structural and Morphological Properties of Nickel and Iron Oxide Coatings
Abstract
This study comprehensively investigates and compares the effects of Cold Atmospheric Plasma (CAP) treatment as a potential alternative to thermal annealing on the structural and morphological properties of two distinct thin films: nickel (Ni) and iron oxide (FeₓOᵧ), both electrochemically deposited on ITO substrates. Characterization via X-ray diffraction (XRD) and atomic force microscopy (AFM) revealed that the material's nature dictates its response to post-processing. For nickel, short-duration CAP exposure (2.5-5 min) optimally enhanced crystallinity and surface smoothness by reducing grain size and roughness, while longer exposures led to oxidation and increased roughness. Conversely, for iron oxide, even brief CAP treatment initiated a transformation from a monocrystalline to a polycrystalline structure, forming a mixture of phases (Fe₃O₄, γ-Fe₂O₃). The smoothest iron oxide surface was achieved after 5-10 minutes of CAP, with excessive exposure (15 min) causing surface damage. Thermal annealing proved superior for nickel at 200 oC, yielding the smallest grains and smoothest surface. However, it was inadequate for optimal iron oxide crystallization. This work establishes CAP as a rapid, energy-efficient alternative to annealing, with its optimal parameters being highly material-specific, crucial for tailoring functional coatings in catalysis and sensing.
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