Modelling of Optical and Surface Properties of Aluminum Thin Films Using Spectroscopic Ellipsometry
Abstract
In this study, aluminum (Al) thin films deposited on soda lime glass substrates were investigated using spectroscopic ellipsometry with a focus on optical modeling and surface characteristics. The films were fabricated by thermal deposition under controlled vacuum conditions. A multilayer optical model, including Al, native oxide (Al₂O₃), and surface-roughness layers, was developed to accurately fit the experimental ellipsometric data.The analysis was performed in the photon energy range of 0.5–6 eV at multiple incidence angles. The Cauchy and Lorentz dispersion models were applied to represent the dielectric response of the oxide and metallic layers, respectively. The surface roughness was modeled using the effective medium approximation. The obtained results demonstrate that surface morphology and oxide layer formation play a significant role in determining the optical behavior of Al thin films. Variations in surface roughness and interface properties were found to influence the refractive index and extinction coefficient. The developed optical model showed good agreement with experimental data, confirming its reliability in describing complex thin-film systems. These findings highlight the importance of accurate optical modeling for the design and optimization of thin film materials in engineering and optoelectronic applications.
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