RF ELECTROMAGNETIC FIELD ABSORPTION INSIDE HELICON ION SOURCE IN NONAXIAL MAGNETIC FIELD

  • O. V. Alexenko Institute of Applied Physics NAS of Ukraine Petropavlovskaya st., 58, Sumy, 40000, Ukraine
  • V. I. Miroshnichenko Institute of Applied Physics NAS of Ukraine Petropavlovskaya st., 58, Sumy, 40000, Ukraine
  • V. I. Voznyi Institute of Applied Physics NAS of Ukraine Petropavlovskaya st., 58, Sumy, 40000, Ukraine

Abstract

The paper studies integral characteristics and one-dimensional distribution of RF power absorption in a helicon plasma with external magnetic field directed at an angle to a plasma plane. Two kinds of working gas heli and hydrogen are considered. A simplified model of a helicon plasma plane layer is used here. Calculation results are used to explain power absorption in a compact helicon ion source with nonuniform external magnet field. An ion source is a part of a nuclear scanning microprobe (NSMP) injector at the Institute of Applied Physics NAS of Ukraine. Calculations for ion source parameters of the NSMP injector show a resonant behaviour of integral RF power absorption as a function of a magnet field inclination angle. A model (planar) geometry is verified here for solution of this problem.

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Author Biographies

O. V. Alexenko, Institute of Applied Physics NAS of Ukraine Petropavlovskaya st., 58, Sumy, 40000, Ukraine

 

V. I. Miroshnichenko, Institute of Applied Physics NAS of Ukraine Petropavlovskaya st., 58, Sumy, 40000, Ukraine

 

 
V. I. Voznyi, Institute of Applied Physics NAS of Ukraine Petropavlovskaya st., 58, Sumy, 40000, Ukraine
 

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Published
2015-06-13
Cited
0 article
How to Cite
Alexenko, O., Miroshnichenko, V., & Voznyi, V. (2015). RF ELECTROMAGNETIC FIELD ABSORPTION INSIDE HELICON ION SOURCE IN NONAXIAL MAGNETIC FIELD. East European Journal of Physics, 2(1), 77-87. https://doi.org/10.26565/2312-4334-2015-1-12