Properties of Single Crystal Silicon Doped with Vanadium

  • Khojakbar S. Daliev Branch of the Federal State Budgetary Educational Institution of Higher Education “National Research University MPEI”, Tashkent, Uzbekistan https://orcid.org/0000-0002-2164-6797
  • Zafarjon M. Khusanov Institute of Semiconductor Physics and Microelectronics at the National University of Uzbekistan, Tashkent, Uzbekistan https://orcid.org/0009-0005-9420-8033
Keywords: Silicon, Vanadium, Diffusion, Resistivity, Optically active, Oxygen, Carbon

Abstract

The paper reports the sharp increase in resistivity and the conductivity change (type) in the single-crystal silicon sample doped with vanadium. The electrical and optical properties of single-crystalline silicon were determined Hall- and four-probe measurements and infrared (IR-) spectroscopy. Relative resistance, charge carrier concentration, mobility, and concentration of optically active oxygen and carbon in the samples were determined layer-by-layer. It is shown that in silicon samples doped with vanadium the concentration of optically active oxygen atoms tends to reduce.

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References

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Published
2024-03-05
Cited
How to Cite
Daliev, K. S., & Khusanov, Z. M. (2024). Properties of Single Crystal Silicon Doped with Vanadium. East European Journal of Physics, (1), 366-369. https://doi.org/10.26565/2312-4334-2024-1-35