Investigation of Defect Formation in Silicon Doped with Silver and Gadolinium Impurities by Raman Scattering Spectroscopy

  • Sharifa B. Utamuradova Institute of Semiconductor Physics and Microelectronics of National University of Uzbekistan, Tashkent, Uzbekistan https://orcid.org/0000-0002-1718-1122
  • Shakhrukh Kh. Daliev Institute of Semiconductor Physics and Microelectronics of National University of Uzbekistan, Tashkent, Uzbekistan
  • Elmira M. Naurzalieva Institute of Semiconductor Physics and Microelectronics of National University of Uzbekistan, Tashkent, Uzbekistan https://orcid.org/0000-0002-5110-1851
  • Xushnida Yu. Utemuratova Karakalpak State University, Nukus, Karakalpakstan
Keywords: Silicon, Gadolinium, Silver, Raman spectrum, Doping, Complex defects

Abstract

Silicon doped with gadolinium and silver impurities were studied using a Renishaw InVia Raman spectrometer. Registration and identification of both crystalline and amorphous phase components in the samples was carried out. Some changes are observed in the Raman spectra of gadolinium-doped silicon samples compared to the initial sample. It has been experimentally found that an increase in the silver impurity concentration in gadolinium-doped silicon leads to a smoothing of the Raman spectrum, which indicates the formation of a more perfect crystal structure.

Downloads

Download data is not yet available.

References

Kh.S. Daliev, Sh.B. Utamuradova, O.A. Bozorova, and Sh.Kh. Daliev, Geliotekhnika. 41(1), 80 (2005).

Kh.S. Daliev, Sh.B. Utamuradova, I.Kh. Khamidzhonov, A.Zh. Akbarov, I.K. Mirzairova, and Zh. Akimova, Inorganic Materials, 37(5), 436 (2001). https://doi.org/10.1023/A:1017556212569

B.E. Egamberdiev, Sh.B. Utamurodova, S.A. Tachilin, M.A. Karimov, K.Yu. Rashidov, A.R. Kakhramonov, M.K. Kurbanov, et al., Applied Solar Energy, 58(4), 490 (2022). https://doi.org/10.3103/S0003701X22040065

Sh.B. Utamuradova, A.V. Stanchik, K.M. Fayzullaev, and B.A. Bakirov, Applied Physics, (2), 33 (2022). https://applphys.orion-ir.ru/appl-22/22-2/PF-22-2-33_RU.pdf (in Russian)

M. Yang, D. Huang, P. Hao, F. Zhang, X. Hou, and X. Wang, J. Appl. Phys. 75 (1), 651 (1993). https://doi.org/10.1063/1.355808

H. Tanino, A. Kuprin, and H. Deai, Phys. Rev. B, 53 (4), 1937 (1996), https://doi.org/10.1103/PhysRevB.53.1937

Sh.B. Utamuradova, Sh.Kh. Daliyev, K.M. Fayzullayev, D.A. Rakhmanov, and J.Sh. Zarifbayev, New Materials, Compounds and Applications, 7(1), 37 (2023). http://jomardpublishing.com/UploadFiles/Files/journals/NMCA/V7N1/Utamuradova_et_al.pdf

N.R.C. Raju, K.J. Kumar, and A. Subrahmanyam, AIP Conference Proceedings, 1267(1), 1005 (2010). https://doi.org/10.1063/1.3482261

Sh.B. Utamuradova, Kh.S. Daliev, Sh.Kh. Daliev, and K.M. Fayzullaev, Applied Physics, (6), 90 (2019).

T. Grzyb, R.J. Wiglusz, V. Nagirnyi, A. Kotlov, and S. Lisa, Dalton Trans. 43(18), 6925 (2014), https://doi.org/10.1039/C4DT00338A

M. Ivanda, O. Gamulin, and W. Kiefer, Journal of Molecular Structure. 480–481, 651 (1999), https://doi.org/10.1016/s0022-2860(98)00922-3

W. Wei, Vacuum. 81(7), 857 (2007). https://doi.org/10.1016/j.vacuum.2006.10.005

D. Abidi, B. Jusserand, and J.-L. Fave, Phys. Rev. B, 82(7), 075210 (2010), https://doi.org/10.1103/PhysRevB.82.075210

C. Smit, R.A. C.M.M. van Swaaij, H. Donker, A.M.H.N. Petit, W.M.M. Kessels and M.C.M. van de Sanden, Journal of Applied Physics 94(5), 3582 (2003), https://doi.org/10.1063/1.1596364

A.M. Grishin, A. Jalalian, and M.I. Tsindlekht, AIP Advances 5(5), 057104 (2015), https://doi.org/10.1063/1.4919810

P. G. Spizzirri, J.-H. Fang, S. Rubanov, E. Gauja, S. Prawer, Materials Forum. 34, (2010).

S. Agnello, D. Di Francesca, A. Alessi, G. Iovino, M. Cannas, S. Girard, A. Boukenter, and Y. Ouerdane, Journal of Applied Physics. 114(10), 104305 (2013), https://doi.org/10.1063/1.4820940

Sh.B. Utamuradova, and E.M. Naurzalieva, Semiconductor Physics and Microelectronics. 4(1), 8 (2022) (in Russian)

Published
2023-09-04
Cited
How to Cite
Utamuradova, S. B., Daliev, S. K., Naurzalieva, E. M., & Utemuratova, X. Y. (2023). Investigation of Defect Formation in Silicon Doped with Silver and Gadolinium Impurities by Raman Scattering Spectroscopy. East European Journal of Physics, (3), 430-433. https://doi.org/10.26565/2312-4334-2023-3-47