Ion implantation, ion-beam  mixing  during  simultaneous  ion implantation and   metal deposition

M. A. Lisovenko Sumy State University
K. O. Belovol Sumy State University
O. V. Kyrychenko Sumy State University
V. T. Shablya Sumy State University
J. Kassi Sumy State University
B. P. Gritsenko Institute of Strength Physics and Materials Science of RAS (Tomsk)
V. V. Burkovska V.N. Karazin KharkivNational University

Keywords: ion implantation, ion-plasma deposition, corrosion resistance, microhardness

Abstract

This article present‘s researching results of ion implantation Ta in Cu monocrystal with different plane. Also the article demonstrates the processes of ion mixing and deposition of ions Ta+ and Cu+ on polycrystalline Al substrate. Effect of crystalline plane line was found. At the same implantation dose the dose at surface layer is different. Possibilities of the simultaneous ion implantation Ta and Cu and deposition on Al substrate are showed. It causes good corrosion resistance, microhardness increasing of the surface layers.

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Author Biographies

M. A. Lisovenko, Sumy State University

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K. O. Belovol, Sumy State University

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O. V. Kyrychenko, Sumy State University

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V. T. Shablya, Sumy State University

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J. Kassi, Sumy State University

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B. P. Gritsenko, Institute of Strength Physics and Materials Science of RAS (Tomsk)

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V. V. Burkovska, V.N. Karazin KharkivNational University

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