Formation stages of pulsed discharge in oxygen and carbon tetrafluoride
Abstract
This paper reports the current and voltage oscilloscope waveforms of a pulsed discharge measured in a broad range of frequencies (from 20 to 300 kHz) and duty cycle from 0.15 to 0.85 for two values of oxygen and carbon tetrafluoride pressure values of 0.1 and 1 Torr. Current oscilloscope waveforms of the glow pulsed discharge have been found to possess a plasma phase and an afterglow phase. The following stages of the plasma phase have been observed: 1. The capacitive current pulse of about 0.5–1 μs in duration; 2. The current growth stage the duration of which depends on the gas species, the plasma phase duration and the pressure; 3. The plateau (remarkably pronounced only for carbon tetrafluoride and absent for other gases); 4. The current decrease of tens microseconds in duration down to the level corresponding to that of the direct voltage discharge.
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References
Harry J. E. Introduction to Plasma Technology: Science, Engineering and Applications. — Wiley, 2010.
Lee J. -H., Liu D. N, Wu Ch. -T. Introduction to flat panel displays. — Wiley, 2008.
Chabert P., Braithwaite N. Physics of RadioFrequency Plasmas, Cambridge University Press. — Cambridge, 2011.
Fridman A. Plasma Chemistry, Cambridge University Press, 2008.
Korolev Yu. D., Mesyats G. A. Physics of pulsed breakdown in gases. — Ekaterinburg: URO-Press, 1998.
Efimova V. PhD Thesis «Study in analytical glow discharge spectrometry and its application in materials science». — Technische Universitat Dresden, 2011.
Potamianou S., Spyrou N., Held B. A study of the behavior of a DC pulsed low pressure point-to-plane discharge // Eur. Phys. J.: AP. — 2003. — Vol. 22. — P. 179–188.
Clement F., Held B., Soulem N., Spyrou N. Polystyrene thin films treatment under DC pulsed discharges conditions in nitrogen // Eur. Phys. J.: AP. — 2001. — Vol. 13. — P. 67–73.
Clement F., Held B., Soulem N. Polystyrene thin films treatment under DC pulsed discharges conditions in oxygen // Eur. Phys. J.: AP. — 2001. — Vol. 16. — P. 141–147.
Clement F., Held B., Soulem N. Polystyrene thin films treatment under DC pulsed discharges conditions in nitrogen-argon and oxygen-argon mixtures // Eur. Phys. J.: AP. — 2002. — Vol. 17. — P. 119–130.
Bussiahn R., Gortchakov S., Lange H., Loffhagen D. Pulsed excitation of low-pressure He-Xe glow discharges // J. Phys. D: Appl. Phys. — 2006. — Vol. 39. — P. 66–72.
Zeze D. A., Joyce A. M., Anderson C. A., Brown N. M. D. Control and mass selection of CnHm fragments in an inductively coupled pulsed plasma // App. Phys. Letters. — 2002. — Vol. 80, No. 1. — P. 22–24.
Booth J. P., Abada H., Chabert P. and Graves D. B. CF and CF2 radical kinetics and transport in a pulsed CF4 ICP // Plasma Sources Sci. Technol. — 2005. — Vol. 14. — P. 273–282.
Maresca A., Orlov K., and Kortshagen U. Experimental study of diffusive cooling of electrons in a pulsed inductively coupled plasma // Physical Review E. — 2002. — Vol. 65, No. 5. — P. 056405.
Malkin O.A. Impulsny tok i relaksatsiya v gaze (Pulsed current and relaxation is a gas). — M.: Atomizdat, 1974. — 280 p.
De Benedictis S., Dilecce G., and Simek M. Excitation and decay of N2(B3Pg, v) states in a pulsed discharge: Kinetics of electrons and long-lived species // Journal of Chemical Phy sics. — 1999. — Vol. 110, No. 6. — P. 2947–2962.
Kono A., Negative ions in processing plasmas and their effect on the plasma structure // Applied Surface Science. — 2002. — Vol. 192, issues 1–4. — P. 115–134.
Gudmundsson J. T., Kouznetsov I. G., Patel K. K. and Lieberman M. A. Electronegativity of low-pressure high-density oxygen discharges // J. Phys. D: Appl. Phys. — 2001. —Vol. 34, No. 7. — P. 1100–1109.
Gudmundsson J. T. Recombination and detachment in oxygen discharges: the role of metastable oxygen molecules // J. Phys. D: Appl. Phys. — 2004. — Vol. 37, No. 15. — P. 2073– 2081.
Franklin R. N. The role of O2 (a 1Δg) metastables and associative detachment in discharges in oxygen // J. Phys. D: Appl. Phys. — 2001. — Vol. 34, No. 12. — P. 1834–1839.
Ivanov V. V., Klopovsky K. S., Lopaev D. V., Rakhimov A. T., and Rakhimova T. V. Experimental and Theoretical Investigation of Oxygen Glow Discharge Structure at Low Pressures // IEEE Transactions on Plasma Science. — 1999. — Vol. 27, No. 5. — P. 1279–1287.
Kaga K., Kimura T., Ohe K. Spatial profile measurements of charged particles in capacitively-coupled RF (13.56 MHz) oxygen discharges // Jpn. J. Appl. Phys. — 2001. — Vol. 40, No. 1. — P. 330–331.
Denpoh K., Nanbu K. Self-consistent particle simulation of radio-frequency CF4 discharge: effect of gas pressure // Jpn. J. Appl. Phys. — 2000. — Vol. 39, No. 5A. — P. 2804–2808.
Metsi E., Gogolides E., and Boudouvis A. Instabilities and multiple steady states of radiofrequency discharges in CF4 // Physical Review E. — 1996. — Vol. 54, No. 1. — P. 782–790.
Imtiaz M. A., Tsuruta Sh. and Mieno T. Production of a large-volume negative-ion source using a multistring-type CF4 magnetized plasma // Plasma Sources Sci. Technol. — 2007. — Vol. 16, No. 2. — P. 324–329.