Ambipolar Diffusion and Electric Field Reversal in Electronegative Plasma with Charged Nanoparticles

Keywords: Ambipolar diffusion, Analytic model, Ambipolar electric field, Nanoparticles, Negative ions

Abstract

An analytical model of ambipolar diffusion in plasma consisting of electrons, positive ions, negative ions, and negatively charged nanoparticles is proposed. Analytical expressions are derived for the ambipolar diffusion coefficients of all charged species, as well as for the ambipolar electric field strength. In plasma containing only electrons, positive ions, and negative ions, high concentrations of negative ions lead to a transition from ambipolar to free diffusion, where the ambipolar diffusion coefficients approach the corresponding free diffusion coefficients. In plasma consisting of electrons, positive ions, and negatively charged nanoparticles, high nanoparticle concentrations result in qualitatively different behavior: the ambipolar diffusion coefficient of electrons approaches twice the free electron diffusion coefficient, while the ambipolar diffusion coefficient of positive ions approaches twice the free diffusion coefficient of nanoparticles. For the general four-component plasma, the ambipolar diffusion regime is governed by the dominant electron-loss mechanism, namely, electron attachment to either electronegative gas molecules or nanoparticles. If electron attachment to gas molecules dominates, the ambipolar diffusion coefficients of electrons, negative ions, and nanoparticles remain close to their free diffusion coefficients. In contrast, when electron attachment to nanoparticles dominates, these coefficients approach twice the corresponding free diffusion coefficients. The ambipolar diffusion coefficient of positive ions was found to depend strongly on the dominant negatively charged species in plasma. Under intensive negative-ion formation, it approaches the free diffusion coefficient of negative ions, whereas in plasma dominated by electron attachment to nanoparticles it asymptotically approaches twice the free diffusion coefficient of nanoparticles. It is shown that sufficiently high concentrations of negative ions and/or charged nanoparticles substantially reduce the ambipolar electric field strength and may even reverse its sign. A weakly negative ambipolar electric field can remove excess negative ions and nanoparticles from plasma, thereby stabilizing the discharge. Experiments with acetylene plasma demonstrated intense transport of small nanoparticles toward the tube walls, which may serve as indirect evidence of an ambipolar electric-field reversal.

Downloads

Download data is not yet available.

References

A. Fridman, and G. Friedman, Plasma Medicine, (John Wiley, Chichester. 2013).

M. Domonkos, P. Tichá, J. Trejbal, and P. Demo, Appl. Sci. 11, 4809 (2021). https://doi.org/10.3390/app11114809

C. E. Luchian, C. Lungoci, M.-A. Ciolan, C.-M. Rimbu, L. D. Miron, and I. Motrescu, Appl. Sci. 15, 10366 (2025). https://doi.org/10.3390/app151910366

P. Attri, K. Ishikawa, T. Okumura, K. Koga, and M. Shiratani, Processes 8, 1002 (2020). https://doi.org/10.3390/pr8081002

N. Puač, M. Gherardi, and M. Shiratani, Plasma Processes and Polymers, 15, 1700174 (2018). https://doi.org/10.1002/ppap.201700174

N.N. Misra, Oliver Schlüter, and P.J. Cullen, editors, Cold Plasma in Food and Agriculture: Fundamentals and Applications, (Academic Press, London, 2016). https://doi.org/10.1016/C2014-0-00009-3

W. Sсhottky, Physikalische Zeitschrift 25, 342 (1924).

W. Schottky, and J. Issendorff, Zeitschrift für Physik 31, 163 (1925). https://doi.org/10.1007/BF02980570

V. Lisovskiy, S. Dudin, and V. Yegorenkov, Phys. Scr. 98, 106101 (2023). https://doi.org/10.1088/1402-4896/acf89c

V. Lisovskiy, J.-P. Booth, J. Jolly, S. Martins, K. Landry, D. Douai, V. Cassagne, and V. Yegorenkov, J. Phys. D: Appl. Phys. 40, 6989 (2007). https://doi.org/10.1088/0022-3727/40/22/020

N. R. Behera, A. K. Kanakati, S. Barik, S. Dutta, and G. Aravind, J. Chem. Phys. 163, 024322 (2025). https://doi.org/10.1063/5.0278243

B. Naik, Sh. Sharma, R. Narayanan, D. Sahu, M. Bandyopadhyay, A. Chakraborty, M. Singh, R. D. Tarey, and A. Ganguli, J. Instrumentation, 20, C09003 (2025). https://doi.org/10.1088/1748-0221/20/09/C09003

Z. E. Ankouri, M. El Bojaddaini, M. E. Kaouini, A. Missaoui, and H. Chatei, Contributions to Plasma Physics, 65, e70058 (2025). https://doi.org/10.1002/ctpp.70058

A. Paul, S. Melanson, T. Junginger, and M. Dehnel, J. Phys. Confer. Series, 2743, 012083 (2024). https://doi.org/10.1088/1742-6596/2743/1/012083

A. Paul, S. Melanson, T. Junginger, and M. Dehnel, J. Instrumentation, 19, C05053 (2024). https://doi.org/10.1088/1748-0221/19/05/C05053

I. Sereda, Y. Hrechko, M. Azarenkov, and K. Sereda, Intern. J. Hydrogen Energy, 109, 1321 (2025). https://doi.org/10.1016/j.ijhydene.2025.02.222

I. Sereda, Y. Hrechko, and M. Azarenkov, Phys. Plasmas, 31, 053516 (2024). https://doi.org/10.1063/5.0202579

I. Sereda, Y. Hrechko, I. Babenko, and M. Azarenkov, Vacuum, 200, 111006 (2022). https://doi.org/10.1016/j.vacuum.2022.111006

C. Poggi, A. Pimazzoni, E. Sartori, and G. Serianni, Nuclear Fusion, 65, 026064 (2025). https://doi.org/10.1088/1741-4326/adabf9

M. Bacal, editor, Physics and Applications of Hydrogen Negative Ion Sources (Springer, Cham, Switzerland, 2023). https://doi.org/10.1007/978-3-031-21476-9

V. Dudnikov, Development and Applications of Negative Ion Sources, (Springer, Cham, Switzerland, 2023). https://doi.org/10.1007/978-3-031-28408-3

V. Lisovskiy, S. Dudin, A. Shakhnazarian, P. Platonov, and V. Yegorenkov, East European Journal of Physics, (3), 172 (2024). https://doi.org/10.26565/2312-4334-2024-3-17

S. V. Dudin, S. D. Yakovin, and A. V. Zykov, East European Journal of Physics 3, 606 (2023). https://doi.org/10.26565/2312-4334-2023-3-72

V. O. Litvinov, I. I. Okseniuk, D. I. Shevchenko, and V. V. Bobkov, East European Journal of Physics 3, 10 (2023). https://doi.org/10.26565/2312-4334-2023-3-01

M. Jiménez-Redondo, I. Tanarro, and V.J. Herrero, Plasma Sources Sci. Technol. 31, 065003 (2022). https://doi.org/10.1088/1361-6595/ac70f8

T. Wang, Sh. Rauf, N. Friedrichs, I. Korolov, J. Kenney, and J. Schulze, Phys. Plasmas, 33, 023501 (2026). https://doi.org/10.1063/5.0300388

I. Tanarro, R. J. Peláez, and V. J. Herrero, Plasma Physics and Controlled Fusion, 67, 035014 (2025). https://doi.org/10.1088/1361-6587/adb17b

K. Kalita, R. Moulick, and B. Saikia, Phys. Plasmas, 32, 62105 (2025). https://doi.org/10.1063/5.0267438

V. Lisovskiy, J.-P. Booth, K. Landry, D. Douai, V. Cassagne, and V. Yegorenkov, J. Phys. D: Appl. Phys. 40, 6631 (2007). https://doi.org/10.1088/0022-3727/40/21/023

V. Lisovskiy, J.-P. Booth, K. Landry, D. Douai, V. Cassagne, and V. Yegorenkov, Plasma Sources Sci. Technol. 17, 025002 (2008). https://doi.org/10.1088/0963-0252/17/2/025002

E. Baratte, L. Kuijpers, T. Silva, V. Guerra, M. C. M. van de Sanden, J.-P. Booth, and O. Guaitella, Plasma Sources Sci. Technol. 35, 015009 (2026). https://doi.org/10.1088/1361-6595/ae24a9

P. Viegas, B. Berdugo, and V. Guerra. Plasma Chemistry and Plasma Processing, 46, 22 (2026). https://doi.org/10.1007/s11090-025-10607-7

R. Masheyeva, M. Vass, M. Myrzaly, Ch.-B. Tian, K. Dzhumagulova, J. Schulze, Z. Donkó, and P. Hartmann, Plasma Sources Sci. Technol. 34, 045017 (2025). https://doi.org/10.1088/1361-6595/adcb6b

V.A. Lisovskiy, and V.D. Yegorenkov, Vacuum, 80, 458 (2006). https://doi.org/10.1016/j.vacuum.2005.07.038

Bh. Ramkorun, G. Chandrasekhar, V. Rangari, S. C. Thakur, R. B Comes, and E. Thomas, Plasma Sources Sci. Technol. 33, 115004 (2024). https://doi.org/10.1088/1361-6595/ad8ae8

J. Niemann, V. Schneider, and H. Kersten, Phys. Plasmas, 32, 013510 (2025). https://doi.org/10.1063/5.0243765

L. Vogelhuber, I. Korolov, M. Vass, K. Nösges, T. Bolles, K. Köhn, M. Klich, R. P. Brinkmann, and T. Mussenbrock, Plasma Sources Sci. Technol. 34, 125012 (2025). https://doi.org/10.1088/1361-6595/ae253e

D. Yang, X. Wang, Zh. Zhou, H. Li, W. Zhang, Y. Liu, J. Schulze, P. Hartmann, Z. Donkó, and Y. Fu, Appl. Phys. Letters, 127, 124101 (2025). https://doi.org/10.1063/5.0281351

B. Mahdavipour and J. T. Gudmundsson, Plasma Sources Sci. Technol. 34, 045005 (2025). https://doi.org/10.1088/1361-6595/adc503

R. Masheyeva, M. Vass, X.-K. Wang, Y.-X. Liu, A. Derzsi, P. Hartmann, J. Schulze, and Z. Donkó, Plasma Sources Sci. Technol. 33, 045019 (2024). https://doi.org/10.1088/1361-6595/ad3c69

X.-K. Wang, I. Korolov, S. Wilczek, R. Masheyeva, Y.-X. Liu, Y.-H. Song, P. Hartmann, Z. Donkó, and J. Schulze, Plasma Sources Sci. Technol. 33, 085001 (2024). https://doi.org/10.1088/1361-6595/ad5eb9

J. B. Thompson, Proc. Phys. Soc. 73, 818 (1959). https://doi.org/10.1088/0370-1328/73/5/416

A. J. Lichtenberg, V. Vahedi, M. A. Lieberman, and T. Rognlien, J. Appl. Phys. 75, 2339 (1994). http://dx.doi.org/10.1063/1.356252

E. Stoffels, W. W. Stoffels, D. Vender, M. Haverlag, G. M. W. Kroesen, F de Hoog, J. Contrib. Plasma Phys. 35, 331 (1995). https://doi.org/10.1002/ctpp.2150350404

Y. T. Lee, M. A. Lieberman, A. J. Lichtenberg, F. Bose, H. Baltes, R. Patrick, J. Vac. Sci. Technol. A, 15, 113 (1997). https://doi.org/10.1116/1.580452

S. Kim, M. A. Lieberman, A. J. Lichtenberg, and J. T. Gudmundsson, J. Vac. Sci. Technol. A 24, 2025 (2006). http://dx.doi.org/10.1116/1.2345645

V. Lisovskiy, and V. Yegorenkov, Europhysics Letters, 99, 35002 (2012). https://doi.org/10.1209/0295-5075/99/35002

C. Dominique, and C. Arnas, J. Appl. Phys. 101, 123304 (2007). https://doi.org/10.1063/1.2748365

C. Arnas, A. Mouberi, K. Hassouni, A. Michau, G. Lombardi, X. Bonnin, F. Bénédic, and B. Pégourié, J. Nuclear Materials, 390 391, 140 (2009). https://doi.org/10.1016/j.jnucmat.2009.01.148

K.K. Kumar, L. Couëdel, and C. Arnas, Phys. Plasmas, 20, 043707 (2013). https://doi.org/10.1063/1.4802809

L. Couëdel, K. Kishor Kumar, and C. Arnas, Phys. Plasmas, 21, 123703 (2014). https://doi.org/10.1063/1.4903465

S. Barbosa, F. R. A. Onofri, L. Couëdel, M. Wozniak, C. Montet, C. Pelcé, C. Arnas, L. Boufendi, E. Kovacevic, J. Berndt, and C. Grisolia, J. Plasma Phys. 82, 615820403 (2016). https://doi.org/10.1017/S0022377816000714

C. Arnas, A. Michau, G. Lombardi, L. Couëdel, and K. Kishor Kumar, Phys. Plasmas 20, 013705 (2013). https://doi.org/10.1063/1.4776681

L. Worner, E. Kovacevic, J. Berndt, H. M. Thomas, M. H. Thoma, L. Boufendi, and G. E. Morfill, New Journal of Physics, 14, 023024 (2012). https://doi.org/10.1088/1367-2630/14/2/023024

J. Beckers, J. Berndt, D. Block, M. Bonitz, P. J. Bruggeman, L. Couëdel, G. L. Delzanno, et al. Phys. Plasmas, 30, 120601 (2023). https://doi.org/10.1063/5.0168088

E. Kovacevic, J. Berndt, Th. Strunskus, and L. Boufendi, J. Appl. Phys. 112, 013303 (2012). https://doi.org/10.1063/1.4731751

E. Kovačević, J. Berndt, I. Stefanović, H.-W. Becker, C. Godde, Th. Strunskus, J. Winter, and L. Boufendi, J. Appl. Phys. 105, 104910 (2009). http://dx.doi.org/10.1063/1.3129318

V. A. Lisovskiy, S. V. Dudin, P. P. Platonov, S. I. Bogatyrenko, and A. A. Minenkov, Probl. At. Sci. Technol. 4, 135 (2019), https://vant.kipt.kharkov.ua/ARTICLE/VANT_2019_4/article_2019_4_135.pdf

M. Mikikian, L. Couedel, M. Cavarroc, Y. Tessier, and L. Boufendi, Eur. Phys. J. Appl. Phys. 49, 13106 (2010). https://doi.org/10.1051/epjap/2009191

M. Mikikian, S. Labidi, E. von Wahl, J. F. Lagrange, T. Lecas, V. Massereau-Guilbaud, I. Géraud-Grenier, et al., Plasma Phys. Control. Fusion, 59, 014034 (2017). https://doi.org/10.1088/0741-3335/59/1/014034

Sh. Amiranashvilia, and M.Y. Yu, Phys. Plasmas, 9, 4825 (2002). https://doi.org/10.1063/1.1517049

J.X. Ma, M.Y. Yu, X.P. Liang, J. Zheng, W.D. Liu, and C.X. Yu, Phys. Plasmas, 9, 1584 (2002). https://doi.org/10.1063/1.1468234

L.Z. Hadid, O. Shebanits, J.-E. Wahlund, M.W. Morooka, A.F. Nagy, and W.L. Tseng, J. Plasma Physics, 88, 555880201 (2022). https://doi.org/10.1017/S0022377822000186

V. Lisovskiy, A. Minenkov, S. Dudin, S. Bogatyrenko, P. Platonov, and V. Yegorenkov, ACS Omega, 7, 47941 (2022). https://doi.org/10.1021/acsomega.2c05846

M. Mao, J. Benedikt, A. Consoli, and A. Bogaerts, J. Phys. D: Appl. Phys. 41, 225201 (2008). https://doi.org/10.1088/0022-3727/41/22/225201

Yu.P. Raizer, Gas Discharge Physics, (Springer, Berlin, 1991).

M. A. Lieberman, and A. J. Lichtenberg, Principles of plasma discharges and materials processing, (Wiley, New York, 2005).

M. Keidar, and I. I. Beilis, Plasma engineering, (Academic Press, London, 2018).

J. Berndt, E. Kovačević, I. Stefanović, O. Stepanovic, S. H. Hong, L. Boufendi, and J. Winter, Contrib. Plasma Phys. 49, 107 (2009). http://dx.doi.org/10.1063/1.3224874

D. U. B. Aussems, S. A. Khrapak, I. Dogan, M. C. M. van de Sanden, and T. W. Morgan, Phys. Plasmas, 24, 113702 (2017). https://doi.org/10.1063/1.5001576

D. Winske, and M. E. Jones, IEEE Trans. Plasma Sci. 22, 454 (1994). https://doi.org/10.1109/27.310655

S. J. Choi, and M. J. Kushner, IEEE Trans. Plasma Sci. 22, 138 (1994). https://doi.org/10.1109/27.279017

H. H. Hwang, and M. J. Kushner, J. Appl. Phys. 82, 2106 (1997). https://doi.org/10.1063/1.366020

W. Xu, N. D’Angelo, and R. L. Merlino, J. Geophys. Res. 98, 7843 (1993). https://doi.org/10.1029/93JA00309

J. Goree, and T. E. Sheridan, J. Vac. Sci. Technol. A 10, 3540 (1992). https://doi.org/10.1116/1.577781

T. E. Sheridan, J. Goree, Y. T. Chiu, R. L. Rairden, and J. A. Kiessling, J. Geophys. Res. 97, 2935 (1992). https://doi.org/10.1029/91JA02801

G. Lapenta, Phys. Plasmas, 6, 1442 (1999). https://doi.org/10.1063/1.873395

H. A. Erikson, Phys. Rev. 28, 372 (1926). https://doi.org/10.1103/PhysRev.28.372

V.A. Lisovskiy, S.V. Dudin, P. P. Platonov, and V.D. Yegorenkov, Phys. Scr. 98, 025601 (2023). https://doi.org/10.1088/1402-4896/acae48

J.C.W. Chien, Polyacetylene: Chemistry, Physics, and Material, (Academic Press, New York, 1984).

A. M. Saxman, R. Liepins, and M. Aldissi, Prog. Polym. Sci. 11, 57 (1985). https://doi.org/10.1016/0079-6700(85)90008-5

Published
2026-06-10
Cited
How to Cite
Lisovskiy, V., Dudin, S., Bogatyrenko, S., Rezunenko, S., & Yegorenkov, V. (2026). Ambipolar Diffusion and Electric Field Reversal in Electronegative Plasma with Charged Nanoparticles. East European Journal of Physics, (2), 445-460. https://doi.org/10.26565/2312-4334-2026-2-50