Current Mechanisms in Zinc Diffusion-Doped Silicon Samples at T = 300 K
Abstract
This work is devoted to the study of current flow in diffusion-doped zinc silicon samples in the dark and when illuminated with light with an intensity in the range from 0.6 to 140 lx and at a temperature of 300 K. At T = 300 K and in the dark, the type of the I–V characteristic contained all areas characteristic of semiconductors with deep energy levels. It was found that when illuminated with light, the type of I–V characteristics of the studied Si samples depended on the value of the applied voltage, the electrical resistivity of the samples, the light intensity, and their number reached up to 6. In this case, linear, sublinear, and superlinear sections were observed, as well as the switching point (sharp current jump) and areas with negative differential conductivities (NDC). The existence of these characteristic areas of the applied voltage and their character depended on the intensity of the light. The experimental data obtained were interpreted in the formation of low dimensional objects with the participation of multiply charged zinc nanoclusters in the bulk of silicon. They changed the energy band structure of single-crystal silicon, which affected generation-recombination processes in Si, leading to the types of I–V characteristics observed in the experiment.
Downloads
References
C.S. Fuller, and F.J. Morin, Phys. Rev. 105, 379 (1957). https://doi.org/10.1103/PhysRev.105.379
E. Merk, J. Hoyman, and E.E. Haller, Solid State Commun. 72, 851 (1989). https://doi.org/10.1016/0038-1098(89)90412-2
S. Weiss, N. Beckman, and R. Kassing, Appl. Phys. A, 50, 151 (1990). https://doi.org/10.1007/BF00343410
E.U. Arzikulov, M. Radzhabova, Sh.J. Quvondiqov, G. Gulyamov, East Eur. J. Phys. (3), 400 (2023). https://doi.org/10.26565/2312-4334-2023-3-43
T. Abdulmecit, Turk. J. Phys. 44(4), 302 (2020). https://doi.org/10.3906/fiz-2007-11
M.K. Bakhadirkhanov, N.F. Zikrillaev, and E.U. Arzikulov, Tech. Phys. Lett. 17, 1 (1991). (in Russian)
M. Neul, I.V. Sprave, L.K. Diebel, L.G. Zinkl, F. Fuchs, Y. Yamamoto, C. Vedder, et al., Phys. Rev. Materials, 8, 043801 (2024). https://doi.org/10.1103/PhysRevMaterials.8.043801
N.F. Zikrillaev, and E.U. Arzikulov, Report. Uzb. Acad. Sci. 11, 27 (1991). (in Russian)
M.A. Lampert, and P. Mark, Current Injection in Solids, (Electrical Science, 1970).
M.C. Ozdemir, O. Sevgili, I. Orak, and A. Turut, Mater. Sci. Semicond. Process. 125, 105629 (2021). https://doi.org/10.1016/j.mssp.2020.105629
S. Boughdachi, Y. Badali, Y. Azizian-Kalandaragh, and S¸ Altindal, J. Elec. Mater. 47, 12 (2018). https://doi.org/10.1007/s11664-018-6593-y
E. Schöll, Nonequilibrium Phase Transitions in Semiconductors. Self-Organisation Induced by Generation and Recombination Processes, (Springer-Verlag, Berlin, Heidelberg, New York, London, Paris, Tokyo, 1987).
V.E. Lashkarev, A.V. Lyubchenko, and M.K. Sheikman, Nonequilibrium processes in photoconductors, (Nauk. Dumka, Kiev, 1981). (in Russian)
D. Degler, U. Weimar, and N. Barsan, ACS Sens. 4, 2228 (2019). https://doi.org/10.1021/acssensors.9b00975
M. Labed, J.Y. Min, A.B. Slim, N. Sengouga, C.V. Prasad, S. Kyoung, and Y.S. Rim, J. Semicond., 44(7), 072801 (2023). https://doi.org/10.1088/1674-4926/44/7/072801
P. Vivek, J. Chandrasekaran, V. Balasubramani, A. Manimekalai, and T.G.V. Prabhu, Surfaces and Interfaces, 37, 102689 (2023). https://doi.org/10.1016/j.surfin.2023.102689
H. Chouaib, M. Aouassa, and M. Bouabdellaoui, J. Mater. Sci: Mater. Electron. 34, 1815 (2023). https://doi.org/10.1007/s10854-023-11171-6
B.I. Shklovsky, a.nd A.L. Efros, Electronic properties of doped semiconductors, (Springer-Verlag, Berlin, Heidelberg, New York, Tokyo, 1979)
N.N. Gerasimenko, and Yu.N. Parkhomenko, Silicon - Nanoelectronics Material, (Technosphere, Moscow, 2007) (in Russian)
M.A. Rafiq, J. Semicond. 39, 061002 (2018). https://doi.org/10.1088/1674-4926/39/6/061002
Copyright (c) 2024 E.U. Arzikulov, M. Radzhabova, Xue Cui, Liu Teng, S.N. Srajev, N. Mamatkulov, Sh.J. Quvondiqov, Vasiliy O. Pelenovich, B. Yang
This work is licensed under a Creative Commons Attribution 4.0 International License.
Authors who publish with this journal agree to the following terms:
- Authors retain copyright and grant the journal right of first publication with the work simultaneously licensed under a Creative Commons Attribution License that allows others to share the work with an acknowledgment of the work's authorship and initial publication in this journal.
- Authors are able to enter into separate, additional contractual arrangements for the non-exclusive distribution of the journal's published version of the work (e.g., post it to an institutional repository or publish it in a book), with an acknowledgment of its initial publication in this journal.
- Authors are permitted and encouraged to post their work online (e.g., in institutional repositories or on their website) prior to and during the submission process, as it can lead to productive exchanges, as well as earlier and greater citation of published work (See The Effect of Open Access).