Analisys of synthesis condition of hard tantalum diboride coatings in magnetron sputtering systems

Abstract

Study of the synthesis parameters of tantalum diboride thin films obtained in RF and DC magnetron sputtering systems was carried out in this paper. A comparative analysis of the synthesis energy conditions of these films was performed. It was shown that the amount, energy of the ions and neutral particles, participating in the deposition and formation of film on the surface of substrate, changes significantly depending on the method (RF or DC) used for film obtaining, which leads to the formation of coatings in different structural states from an amorphous to nanocrystalline with growth texture perpendicular to the plane (00.1).