X-ray study of the structure and stress state of TiN coatings deposited from filtered cathodic-arc plasma in the gas mixture N2 with Ar
Keywords:
vacuum arc deposition, filtered plasma, high-voltage pulse bias potential, nitride coatings, argon, compressive stress, ion bombardmentAbstract
Results of studies of the structure and stress state of coatings deposited by PIII & D method from the filtered cathodic vaccum-arc plasma flow with a high-voltage pulse bias potential with an amplitude of 1 kV applied to the substrate have been discussed. The influence on the characteristics of the TiN coatings additives of Ar in the range 0 to 45 % to N2 medium have been studied with the help of the X-ray diffraction method. The coatings irrespective of the concentration of argon in the gas mixture have a TiN structure (structure type NaCl) with a strong axial texture [110]. With an increase of argon content the level of compressive stresses in the coatings substantially increases from 7 GPa to 10 GPa, the crystallite size decreases slightly from 8.9 nm to 7 nm, and the hardness of the coating remains on an enough high level of 27–32 GPa. The effect of the argon additives on the coatings growth process has been discussed.
