Stoichiometric Evolution of Multi-Phase Tungsten Nitrides under Variable Gas Flow and Auxiliary Plasma Assistance During Magnetron Sputtering
DOI:
https://doi.org/10.26565/2312-4334-2026-3-64Keywords:
Magnetron Sputtering, Nitrides, Tungsten, XRD, Phase, Structure, Gas flowAbstract
In this work, the influence of Ar/N2 gas mixture composition and auxiliary plasma-assisted activation on the structural-phase evolution of tungsten nitride (WN) coatings deposited via planar magnetron sputtering was systematically investigated. The coatings were synthesized using a 100-mm diameter tungsten target under varying reactive gas regimes (from 50% to 10% N₂) and two electrical configurations: an additional biased anode (+200 V) and a standard grounded anode setup. X-ray diffraction coupled with qualitative and quantitative optimization proved that the coatings possess a complex heterophase structure composed of hexagonal hcp-WN and cubic fcc-W2N phases. It has been established that the persistent dominance of the hcp-WN phase with a highly stable (111) texture acts as a rigid energetically favored framework across all gas flow ratios. Decreasing the nitrogen content primarily affects the secondary, more compliant cubic phase component. At a critical nitrogen deficiency of 10%, the growth of the preferred (200) cubic planes becomes heavily suppressed, forcing the matrix towards grain refinement (nanocrystallization) and stimulating the structural integration of mixed-phase (220)fcc + (102)hcp configuration. Furthermore, shifting to the grounded anode configuration collapses the auxiliary glow discharge zone, dropping the near-substrate plasma density from 7.5 × 1010 cm−3 to 4 × 1010 cm−3. The resulting reduction in adatom surface diffusion length causes rapid thermal quenching, leading to complete texture randomization, a sharp fourfold increase in the isotropic (111)fcc + (100)hcp reflection, and the accumulation of structurally imperfect phase boundaries. The application of an auxiliary biased anode serves as an effective tool to decouple the destructive effects of high-energy ion bombardment from the beneficial structural ordering induced by high-flux, low-energy plasma activation.
References
O. Wenzel, V. Rein, M. Hugenschmidt, F. Schilling, C. Feldmann, and D. Gerthsen, RSC Adv. 11, 28198-28210 (2021). https://doi.org/10.1039/D1RA04448F
H. Liu, Z.-S. Wu, L. Huang, B.-W. Zhang, L.-C. Yin, C.-Y. Xu, and L. Zhen, J. Mater. Chem. A, 9, 11323-11330 (2021). https://doi.org/10.1039/D1TA01560E
X. Wu, Y. Jiang, T. Wu, B. Zuo, S. Bian, K. Lu, et al., Nanomaterials, 13, 2205 (2023). https://doi.org/10.3390/nano13152205
Liang, I. Osmond, G. Krach, L.-T. Shi, L. Brüning, U. Ranieri et al., Adv. Funct. Mater. 2313819 (2024). https://doi.org/10.1002/adfm.202313819
S. Anwar, S. Anwar, and B. Priyadarshini, J. Mater. Res. (2024). https://doi.org/10.1557/S43578-024-01353-1
H. Wang, J. Li, K. Li, Y. Lin, J. Chen, L. Gao et al., Chem. Soc. Rev. 50, 1354-1390 (2021). https://doi.org/10.1039/D0CS00415D
Z. Meng, S. Zheng, R. Luo, H. Tang, R. Wang, R. Zhang, et al., Nanomaterials, 12, 2660 (2022). https://doi.org/10.3390/nano12152660
Z.-G. Yang, H.-M. Xu, T.-Y. Shuai, Q.-N. Zhan, Z.-J. Zhang, K. Huang, et al., Nanoscale, 15, 11777-11800 (2023). https://doi.org/10.1039/D3NR01607B
S.K. Mohanty, K.P.K. Reddy, C.-H. Wu, P.-T. Lee, K.-M. Chang, P. Busa, et al., Electronics, 11, 3432 (2022). https://doi.org/10.3390/electronics11213432
S. Han, S. Yang, X. Zeng, Y. Wu, T. Liu, H. Wang, and S. Ding, Crystals, 14, 951 (2024). https://doi.org/10.3390/cryst14110951
J. Li, G.-K. Ren, J. Chen, X. Chen, W. Wu, Y. Liu, X. Chen, et al., JOM, 74, 2717-2738 (2022). https://doi.org/10.1007/s11837-022-05294-0
M. Sasani Ghamsari, Metals, 13, 963 (2023). https://doi.org/10.3390/met13050963
S. Sério, Coatings, 14, 1041 (2024). https://doi.org/10.3390/coatings14081041
Liang, I. Osmond, G. Krach, L.-T. Shi, L. Brüning, U. Ranieri, et al., Adv. Funct. Mater. 34, 2313819 (2024). https://doi.org/10.1002/adfm.202313819
S. Anwar, S. Anwar, and B. Priyadarshini, J. Mater. Res. (2024). https://doi.org/10.1557/S43578-024-01353-1
L.-C. Chang, M.-C. Sung, L.-H. Chu, and Y.-I. Chen, Coatings, 10, 1252 (2020). https://doi.org/10.3390/coatings10121252
L. Bana, D. Vavassori, G. Marra, D. Dellasega, and M. Passoni, Surf. Coat. Technol. 514, 132544 (2025). https://doi.org/10.1016/j.surfcoat.2025.132544
Z. Wang, Y. Li, T. Hu, X. Tian, C. Gong, and H. Zhang, China Surf. Eng. 38, 99-106 (2025). https://doi.org/10.11933/j.issn.1007-9289.20240109001
Kosari Mehr, A. Kosari Mehr, Appl. Phys. A, 129, 693 (2023). https://doi.org/10.1007/s00339-023-06945-y
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