Research of modulation base region processes in p+p-n+-silicon structure

Abstract

The research of depends of p+р-n+-silicon structures volume on locked voltage. Experimentally shown that in two-way-diffusion structures volt-ampere characteristics accept to cubic law by linear distribution of impurities in the base. The increments of capacity from locked voltage are constant. In the diffusionepitaxial structures a sharp decline in the capacity range of voltages from 0 to 5 volts, which is clearly manifested in the dependence of the dynamic capacity of the locked voltage. The observed depends are explained by the uniform modulation of the base region in a two-sided-diffusion structure and strong modulation of the base in the diffusion-epitaxial structure by forming p+p0-n+- and p+p0-i-n+structures in technological processes of p-n-junction.