Comparative analysis of different plasma sources for reactive deposition of coatings and diffusion saturation of metals

Abstract

Probe measurements of parameters of different technological plasma sources used in vacuum-plasma technologies of reactive deposition of coatings and diffusion saturation of metals have been per formed. A comparative analysis has been done of the magnetron plasma source and vacuum-arc dis charge used during reactive deposition of functional coatings, as well as plasma of glow discharge and dual arc used to clean the surface and ion saturation. Peculiarities of application of different plasma sources for improvement of stability and controllability of deposition of high-quality coatings are discussed.