Features of the application of X-ray photoelectron spectroscopy to determine the thickness of ultrathin films

Abstract

In the current paper, the example of measuring the parameters of ultrathin (3 – 5 nm) TiNx films demonstrates the possibility of using X-ray photoelectron spectroscopy (XPS) for determination the thickness and continuity of the films of nanoscale thickness. TiNx films were obtained on silicon by the low-current ion-beam sputtering of titanium target in a nitrogen atmosphere. The advantages of XPS method in comparison with other common methods of solid surface analysis are shown. The method of measuring the thickness of ultrathin films by XPS was described in details.