Structure, properties and morphology of nanostructured coatings solid Ti-Si-N

Abstract

The work presents a comparative analysis of results obtained from samples of nanostructured Ti-Si-N coatings. Element composition, defect structure, concentration of elements throughout the depth of coating and morphology of films were studied using the techniques of slow positron beam (SPB), X-ray photoelectron spectroscopy (XPS), Rutherford backscattering spectrometry (RBS), proton microbeam (µ-PIXE), X-ray diffraction (XRD), scanning electron microscopy with energy − dispersive analysis (SEM with EDS). Results of mentioned above experiments showed that changing the substrate potential during deposition of coatings the stoichiometry and morphology of obtained coatings changes too. After thermal treatment up to 600 °C the formation of two phases: solid solution of TiN, and amorphous or quasi-amorphous α-SiNx (Si3N4) envelope was observed. During experiments the grain size did not change significantly, while the extra energy was used for the completion of the spinodal (phase) segregation.