Structural and phase surface state at high ion implantation of Ti in Cu single crystals

Abstract

The results of experimental research of the concentration interface profiles of the implanted ions and the co product impurities over the depth of the surface of copper single crystals as a result of high-dose implantation of titanium ions are shown. It is found that thin amorphous carbon and oxidized films and titanium carbide are formed close to the surface as a result of titanium ions impact.