RF ELECTROMAGNETIC FIELD ABSORPTION INSIDE HELICON ION SOURCE IN NONAXIAL MAGNETIC FIELD

Authors

  • O. V. Alexenko Institute of Applied Physics NAS of Ukraine Petropavlovskaya st., 58, Sumy, 40000, Ukraine
  • V. I. Miroshnichenko Institute of Applied Physics NAS of Ukraine Petropavlovskaya st., 58, Sumy, 40000, Ukraine
  • V. I. Voznyi Institute of Applied Physics NAS of Ukraine Petropavlovskaya st., 58, Sumy, 40000, Ukraine

DOI:

https://doi.org/10.26565/2312-4334-2015-1-12

Abstract

The paper studies integral characteristics and one-dimensional distribution of RF power absorption in a helicon plasma with external magnetic field directed at an angle to a plasma plane. Two kinds of working gas heli and hydrogen are considered. A simplified model of a helicon plasma plane layer is used here. Calculation results are used to explain power absorption in a compact helicon ion source with nonuniform external magnet field. An ion source is a part of a nuclear scanning microprobe (NSMP) injector at the Institute of Applied Physics NAS of Ukraine. Calculations for ion source parameters of the NSMP injector show a resonant behaviour of integral RF power absorption as a function of a magnet field inclination angle. A model (planar) geometry is verified here for solution of this problem.

Author Biographies

  • O. V. Alexenko, Institute of Applied Physics NAS of Ukraine Petropavlovskaya st., 58, Sumy, 40000, Ukraine

     

  • V. I. Miroshnichenko, Institute of Applied Physics NAS of Ukraine Petropavlovskaya st., 58, Sumy, 40000, Ukraine

     

     
  • V. I. Voznyi, Institute of Applied Physics NAS of Ukraine Petropavlovskaya st., 58, Sumy, 40000, Ukraine
     

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Published

2015-06-13

How to Cite

RF ELECTROMAGNETIC FIELD ABSORPTION INSIDE HELICON ION SOURCE IN NONAXIAL MAGNETIC FIELD. (2015). East European Journal of Physics, 2(1), 77-87. https://doi.org/10.26565/2312-4334-2015-1-12

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