Normurodov MT, Ochilov O, Yuldashev OY, Karshieva ZA, Toshboyev NU. Resistive Switching Behavior of Si/TiO Thin Films for Non-Volatile Memory Applications. East Eur. J. Phys. [Internet]. 2026Jun.10 [cited 2026Jun.11];(2):275-9. Available from: https://periodicals.karazin.ua/eejp/article/view/29364